V. Verlaan

发表

Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

R. Schropp, J. Rath, H. Li, 2009 .

Heat transfer model of an iCVD reactor

R. Schropp, J. Rath, C.H.M. van der Werf, 2009 .

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2006 .

Potential of Hot Wire CVD for Active Matrix TFT Manufacturing

R. Schropp, V. Verlaan, Z. Houweling, 2009 .

All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2008 .

High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition

R. Schropp, J. Rath, Y. Mai, 2007 .

Formation of isolated carbon nanofibers with hot-wire CVD using nanosphere lithography as catalyst patterning technique

R. Schropp, V. Verlaan, Z. Houweling, 2009 .

The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

H. Dekkers, M. Zeman, R. Schropp, 2009 .

Electric field induced surface passivation of Si by atomic layer deposited Al2O3 studied by optical second-harmonic generation

B. Hoex, V. Verlaan, G. Dingemans, 2009, 2009 34th IEEE Photovoltaic Specialists Conference (PVSC).

Dielectric Properties of Ultra Dense (3 g/cm3) Silicon Nitride Deposited by Hot Wire CVD at Industrially Relevant High Deposition Rates

R. Schropp, V. Verlaan, K. V. D. Werf, 2007 .

Bonding rearrangement in amorphous silicon nitrides deposited by hot-wire chemical vapor deposition upon thermal annealing

R. Schropp, J. Rath, Y. Mai, 2008 .

Initiated chemical vapour deposition (iCVD) of thermally stable poly-glycidyl methacrylate

R. Schropp, J. Rath, K. Gleason, 2007 .

Multi‐crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot‐wire CVD silicon nitride as antireflection coating

H. Dekkers, R. Schropp, V. Verlaan, 2007 .

Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cells

R. Schropp, J. Rath, H. Li, 2008 .

Composition and bonding structure of plasma-assisted ALD Al2O3 films

V. Verlaan, G. Dingemans, W. Kessels, 2010 .

Effect of ammonia on Ta filaments in the hot wire CVD process

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2009 .

Reaction Mechanism for Deposition of Silicon Nitride by Hot-Wire CVD with Ultra High Deposition Rate(>7 nm/s)

R. Schropp, V. Verlaan, K. V. D. Werf, 2006 .

Silicon nitride at high growth rate using hot wire chemical vapor deposition

V. Verlaan, 2008 .

Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2008 .