M. Ramon

Invited) Novel Graphene Devices

Deji Akinwande, Chris M. Corbet, M. Ramon, 2013 .

Impact of Deposition and Annealing Temperature on Material and Electrical Characteristics of ALD HfO2

B. E. White, M. Ramon, G. Tam, 2004 .

Film properties of ALD HfO2 and La2O3 gate dielectrics grown on Si with various pre-deposition treatments

M. Ramon, Raghaw Rai, Peter Fejes, 2004 .

Uniaxial-biaxial stress hybridization for super-critical strained-si directly on insulator (SC-SSOI) PMOS with different channel orientations.

S. Murphy, S. Venkatesan, M. Ramon, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

HfO2 Gate Dielectrics Deposited via Tetrakis Diethylamido Hafnium

M. Ramon, Bich-Yen Nguyen, R. Nieh, 2003 .