A. Wendt

发表

Electron‐density and energy distributions in a planar inductively coupled discharge

L. Mahoney, A. Wendt, Ernesto Z. Barrios, 1994 .

Striations in a radio frequency planar inductively coupled plasma

A. Wendt, J. Stittsworth, 1996 .

Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching

P. Nealey, Chi-chun Liu, A. Wendt, 2007 .

Plasma Chemistry and Plasma Processing

A. Wendt, 1997 .

Sub-micron and nanoscale feature depth modulates alignment of stromal fibroblasts and corneal epithelial cells in serum-rich and serum-free media.

Christopher J Murphy, Paul F Nealey, C. Murphy, 2008, Journal of biomedical materials research. Part A.

Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

Chi-Chun Liu, Xiaosong Liu, Franz J. Himpsel, 2008 .

Ion energy control at substrates during plasma etching of patterned structures

A. Wendt, R. Silapunt, K. Kirmse, 2007 .

Control of ion energy distribution at substrates during plasma processing

A. Wendt, S.-B. Wang, 2000 .

High-density plasma sources

Amy E. Wendt, A. Wendt, 2000 .

Magnetic-field-enhanced rf argon plasma for ionized sputtering of copper

N. Hershkowitz, S. Gearhart, A. Wendt, 1997 .

Electron heating by sheaths in radio frequency discharges

A. Wendt, W. Hitchon, 1992 .

SiO2 to Si selectivity mechanisms in high density fluorocarbon plasma etching

Ion Cristian Abraham, R. Claude Woods, Amy E. Wendt, 1996 .

Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity

A. Wendt, S.-B. Wang, 2001 .

Time-resolved spectroscopy using a chopper wheel as a fast shutter.

A. Wendt, J. Boffard, Chun C. Lin, 2015, The Review of scientific instruments.

Detection of fast electrons in pulsed argon inductively-coupled plasmas using the 420.1–419.8 nm emission line pair

A. Wendt, J. Boffard, Chun C. Lin, 2015 .

Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy

A. Wendt, J. Boffard, Chun C. Lin, 2013 .

Argon 420.1–419.8 nm emission line ratio for measuring plasma effective electron temperatures

A. Wendt, J. Boffard, R. O. Jung, 2012 .

Optical diagnostics for characterization of electron energy distributions: argon inductively coupled plasmas

A. Wendt, J. Boffard, R. O. Jung, 2011 .

Optical emission measurements of electron energy distributions in low-pressure argon inductively coupled plasmas

A. Wendt, J. Boffard, R. O. Jung, 2010 .

Measurement of electron energy distribution function in an argon/copper plasma for ionized physical vapor deposition

J. Foster, A. Wendt, J. Booske, 1999 .

Reactor geometry and plasma uniformity in a planar inductively coupled radio frequency argon discharge

A. Wendt, J. Stittsworth, 1996 .

Interactions between plasmas in ionized physical vapor deposition discharges

A. Wendt, Z. C. Lu, T. G. Snodgrass, 2000 .

Fabrication of polymeric substrates with well-defined nanometer-scale topography and tailored surface chemistry

N. Abbott, P. Nealey, Seung-Ryeol Kim, 2002 .

Fourier transform mass spectrometry in an ECR plasma

A. Wendt, J. Shohet, J. Brenna, 1989, IEEE 1989 International Conference on Plasma Science.

Comparison of surface vacuum ultraviolet emissions with resonance level number densities. I. Argon plasmas

A. Wendt, J. Boffard, Chun C. Lin, 2014 .

Absolute densities of long lived species in an ionized physical vapor deposition copper–argon plasma

A. Wendt, J. Booske, I. C. Abraham, 2000 .

Ion-cyclotron-resonance mass spectrometry with a microwave plasma source

A. Wendt, J. Shohet, J. Friedmann, 1991 .

Passive external radio frequency filter for Langmuir probes

A. Wendt, 2001 .

High-voltage constraints for vacuum packaged microstructures

Chester G. Wilson, Y. Gianchandani, A. Wendt, 2003 .

High-Voltage Constraints for Vacuum

Chester G. Wilson, Y. Gianchandani, A. Wendt, 2003 .

HIGH VOLTAGE LIMITS FOR ELECTROSTATIC TRANSDUCERS : ON THE ROLE OF AMBIENT PRESSURE AND DEVICE DIMENSION IN MICRODISCHARGES

Chester G. Wilson, Y. Gianchandani, A. Wendt, 2002 .

Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas

A. Wendt, S.-B. Wang, 1999 .

Application of Excitation Cross-Section Measurements to Optical Plasma Diagnostics

A. Wendt, J. Boffard, Chun C. Lin, 2017 .

Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases

A. Wendt, G. Oehrlein, Ying Zhang, 1994 .

Tailored ion energy distributions at an rf-biased plasma electrode

A. Wendt, Yuk-Hong Ting, X. Qin, 2010 .

Arbitrary substrate voltage wave forms for manipulating energy distribution of bombarding ions during plasma processing

A. Wendt, M. M. Patterson, H. Chu, 2006 .

Measurement of metastable and resonance level densities in rare-gas plasmas by optical emission spectroscopy

A. Wendt, J. Boffard, R. O. Jung, 2009 .

Sidewall damage in plasma etching of Si/SiGe heterostructures

M. Friesen, A. Wendt, L. Klein, 2009 .

Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures

A. Wendt, J. Boffard, Chun C. Lin, 2015 .

Optical Characterization of RF Inductively Coupled Plasmas

V. Kolobov, L. Mahoney, A. Wendt, 2002 .

Nonlocal electron kinetics in a low‐pressure inductively coupled radio‐frequency discharge

V. Kolobov, L. Mahoney, A. Wendt, 1994 .

Langmuir probe measurements of electron temperature and density scaling in multidipole radio frequency plasmas

N. Hershkowitz, A. Wendt, P. Sandstrom, 1993 .

Evidence of weak plasma series resonance heating in the H-mode of neon and neon/argon inductively coupled plasmas

A. Wendt, J. Boffard, R. O. Jung, 2012 .

Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching

P. Nealey, A. Wendt, Yuk-Hong Ting, 2010 .

Antenna sputtering in an internal inductively coupled plasma for ionized physical vapor deposition

J. Foster, A. Wendt, J. Booske, 1998 .

Energy distribution of bombarding ions in plasma etching of dielectrics

A. Wendt, Yuk-Hong Ting, F. Buzzi, 2009 .

Fabrication of ultrahigh-density nanowires by electrochemical nanolithography

M. Lagally, A. Wendt, Yuk-Hong Ting, 2011, Nanoscale research letters.

Measurements of electromagnetic fields in a planar radio‐frequency inductively coupled plasma source

A. Wendt, J. Meyer, 1995 .

An rf sustained argon and copper plasma for ionized physical vapor deposition of copper

A. Wendt, J. Booske, W. Wang, 1999 .

Spatial structure of a planar magnetron discharge

Michael A. Lieberman, M. Lieberman, A. Wendt, 1990 .

Radial current distribution at a planar magnetron cathode

H. Meuth, Michael A. Lieberman, M. Lieberman, 1988 .

Plasma properties determined with induction loop probes in a planar inductively coupled plasma source

A. Wendt, R. Mau, J. Meyer, 1996 .

Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition

J. Foster, A. Wendt, J. Booske, 1998 .

Reduction of effects of rarefaction in ionized physical vapour deposition discharges

A. Wendt, J. Booske, T. G. Snodgrass, 2000 .

Gridless ionized metal flux fraction measurement tool for use in ionized physical vapor deposition studies

A. Wendt, J. Shohet, J. Booske, 1999 .

Radio frequency inductive discharge source design for large area processing

L. Mahoney, A. Wendt, 1996 .

Experiments with back side gas cooling using an electrostatic wafer holder in an electron cyclotron resonance etching tool

Noah Hershkowitz, James W. Taylor, Karen H. R. Kirmse, 1994 .

Profiling and modeling of dc nitrogen microplasmas

Chester G. Wilson, Y. Gianchandani, V. Kolobov, 2003 .

Anisotropic fluorocarbon plasma etching of Si∕SiGe heterostructures

M. Eriksson, A. Wendt, L. Klein, 2005 .