Yuta Sannomiya

Formation of SiO2/Si structure with low interface state density by atmospheric-pressure VHF plasma oxidation

H. Ohmi, H. Kakiuchi, K. Yasutake, 2012 .

Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidation-nitridation

H. Ohmi, H. Kakiuchi, K. Yasutake, 2013, Nanoscale Research Letters.