Ki Seok Kim

发表

Nitriding process for next-generation semiconductor devices by VHF (162 MHz) multi-tile push-pull plasma source

A. Ellingboe, G. Yeom, Y. Ji, 2020 .

Highly uniform wafer-scale synthesis of α-MoO3 by plasma enhanced chemical vapor deposition

J. Son, Ki Seok Kim, Taesung Kim, 2017, Nanotechnology.

Two-Dimensional Transition Metal Dichalcogenides-Based Counter Electrodes for Dye-Sensitized Solar Cells

Geun Young Yeom, Hari Singh Nalwa, H. Nalwa, 2017, 1703.04084.

Atomic Layer Etching Mechanism of MoS2 for Nanodevices.

Dong Woo Kim, Geun Young Yeom, Soonmin Yim, 2017, ACS applied materials & interfaces.

Ultrasensitive MoS2 photodetector by serial nano-bridge multi-heterojunction

Y. Jung, Sungjoo Lee, Jin-Hong Park, 2019, Nature Communications.

Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma

A. Ellingboe, G. Yeom, Y. Ji, 2022, Micromachines.

Silicon nitride deposited by laser assisted plasma enhanced chemical vapor deposition for next generation organic electronic devices

G. Yeom, Y. Ji, Ki Seok Kim, 2020 .

Atomic layer etching of graphene through controlled ion beam for graphene-based electronics

G. Yeom, Y. Ji, Ki Seok Kim, 2017, Scientific Reports.

Wafer-Scale and Low-Temperature Growth of 1T-WS2 Film for Efficient and Stable Hydrogen Evolution Reaction.

Seung-il Kim, Jae‐Hyun Lee, Ki Seok Kim, 2020, Small.

Surface treatment process applicable to next generation graphene-based electronics

I. Oh, Z. Lee, G. Yeom, 2016 .

Atomic layer-by-layer etching of graphene directly grown on SrTiO3 substrates for high-yield remote epitaxy and lift-off

G. Yeom, Ki Seok Kim, H. Kum, 2022, APL Materials.

Multiplication of freestanding semiconductor membranes from a single wafer by advanced remote epitaxy

J. Kong, J. Suh, Sang-hoon Bae, 2022, 2204.08002.

Low temperature silicon nitride grown by very high frequency (VHF, 162 MHz) plasma enhanced atomic layer deposition with floating multi-tile electrode

A. Ellingboe, G. Yeom, Y. Ji, 2022, Surfaces and Interfaces.

A Brief Review of Plasma Enhanced Atomic Layer Deposition of Si3N4

G. Yeom, Y. Ji, Ki Seok Kim, 2019, Applied Science and Convergence Technology.

Graphene nanopattern as a universal epitaxy platform for single-crystal membrane production and defect reduction

Jong-Hyun Ahn, Sang-hoon Bae, Seung-il Kim, 2022, Nature Nanotechnology.

Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment

I. Oh, G. Yeom, Hyungjun Kim, 2016 .

Atomic Layer Engineering of TMDs by Modulation of Top Chalcogen Atoms: For Electrical Contact and Chemical Doping

G. Yeom, Y. Ji, Ki Seok Kim, 2022, ACS Applied Electronic Materials.

Flexible Molybdenum Disulfide (MoS2) Atomic Layers for Wearable Electronics and Optoelectronics.

H. Nalwa, G. Yeom, Ki Seok Kim, 2019, ACS applied materials & interfaces.

Double Negative Differential Resistance Device Based on Hafnium Disulfide/Pentacene Hybrid Structure

J. Cho, Ki Seok Kim, G. Yeom, 2020, Advanced science.

Characteristics of silicon nitride deposited by VHF (162 MHz)-plasma enhanced chemical vapor deposition using a multi-tile push–pull plasma source

A. Ellingboe, G. Yeom, Ki Seok Kim, 2016 .

Silicon Nitride Deposition for Flexible Organic Electronic Devices by VHF (162 MHz)-PECVD Using a Multi-Tile Push-Pull Plasma Source

A. Ellingboe, G. Yeom, Y. Ji, 2017, Scientific Reports.

High-throughput manufacturing of epitaxial membranes from a single wafer by 2D materials-based layer transfer process

Lingping Kong, Jing Kong, Haozhe Wang, 2023, Nature Nanotechnology.

Non-epitaxial single-crystal 2D material growth by geometric confinement

Yaoqiao Hu, Kyeongjae Cho, M. Jo, 2023, Nature.

Impact of 2D-3D Heterointerface on Remote Epitaxial Interaction through Graphene.

Jong-Hyun Ahn, J. Robinson, Jae-Hyun Lee, 2021, ACS nano.

An Optogenetics‐Inspired Flexible van der Waals Optoelectronic Synapse and its Application to a Convolutional Neural Network

G. Yeom, Ki Seok Kim, M. Andreev, 2021, Advanced materials.

Characteristics of pulsed dual frequency inductively coupled plasma

G. Yeom, Ki Seok Kim, Tae Hyung Kim, 2014 .

Effect of large work function modulation of MoS2 by controllable chlorine doping using a remote plasma

Jin-Hong Park, G. Yeom, I. Moon, 2020 .

Atomically Thin-Layered Molybdenum Disulfide (MoS2) for Bulk-Heterojunction Solar Cells.

H. Nalwa, G. Yeom, Ki Seok Kim, 2017, ACS applied materials & interfaces.

Atomic layer etching of InGaAs by controlled ion beam

G. Yeom, Ki Seok Kim, M. Mun, 2017 .

Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasma

G. Yeom, Y. Ji, Ki Seok Kim, 2021, Scientific Reports.

Low-temperature wafer-scale growth of MoS2-graphene heterostructures

G. Yeom, Jae‐Hyun Lee, Ki Seok Kim, 2019, Applied Surface Science.

Hierarchical nanostructures of nitrogen-doped molybdenum sulphide for supercapacitors

B. Kale, G. Yeom, Ki Seok Kim, 2018, RSC advances.

Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene.

V. Pham, G. Yeom, Ki Seok Kim, 2014, Nanoscale.

Atomic layer etching of graphene through controlled ion beam for graphene-based electronics

G. Yeom, Y. Ji, Ki Seok Kim, 2017, Scientific Reports.

A Van Der Waals Reconfigurable Multi‐Valued Logic Device and Circuit Based on Tunable Negative‐Differential‐Resistance Phenomenon (Adv. Mater. 36/2022)

G. Yeom, Ki Seok Kim, M. Andreev, 2022, Advances in Materials.

Layer-controlled thinning of black phosphorus by an Ar ion beam

Sungjoo Lee, Jin-Hong Park, G. Yeom, 2017 .

Hydrogen Evolution Reaction: Wafer‐Scale and Low‐Temperature Growth of 1T‐WS 2 Film for Efficient and Stable Hydrogen Evolution Reaction (Small 6/2020)

Seung-il Kim, Jae‐Hyun Lee, Ki Seok Kim, 2020 .