Hanearl Jung

发表

Very high frequency plasma reactant for atomic layer deposition

C. M. Yoon, I. Oh, Han-Bo-Ram Lee, 2016 .

Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

I. Oh, J. Myoung, Han-Bo-Ram Lee, 2016, Journal of Materials Science.

Bi-layer high-k dielectrics of Al2O3/ZrO2 to reduce damage to MoS2 channel layers during atomic layer deposition

Sunhee Lee, I. Oh, Jongseo Park, 2018, 2D Materials.

Enhanced Light Stability of InGaZnO Thin-Film Transistors by Atomic-Layer-Deposited Y2O3 with Ozone.

I. Oh, J. Myoung, Hyungjun Kim, 2018, ACS applied materials & interfaces.

Coupled self-assembled monolayer for enhancement of Cu diffusion barrier and adhesion properties

C. Mahata, Young‐Chang Joo, Jungmok Seo, 2014 .

Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films.

C. M. Yoon, I. Oh, Se‐Hun Kwon, 2018, ACS applied materials & interfaces.

Surface treatment process applicable to next generation graphene-based electronics

I. Oh, Z. Lee, G. Yeom, 2016 .

Atomic layer deposition of HfO2 on graphene through controlled ion beam treatment

I. Oh, G. Yeom, Hyungjun Kim, 2016 .

Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition.

J. Myoung, Soo‐Hyun Kim, Hyungjun Kim, 2013, ACS nano.

Growth characteristics of graphene synthesized via chemical vapor deposition using carbon tetrabromide precursor

Soo‐Hyun Kim, Hyungjun Kim, Hanearl Jung, 2015 .

Effects of TaN Diffusion Barrier on Cu-Gate ZnO:N Thin-Film Transistors

I. Oh, Hyungjun Kim, W. Maeng, 2016, IEEE Electron Device Letters.

Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Jong-Hyun Ahn, Hyungjun Kim, Zonghoon Lee, 2015 .

Synthesis of few-layered graphene nanoballs with copper cores using solid carbon source.

Ja Hoon Koo, Seulah Lee, Taeyoon Lee, 2013, ACS Applied Materials and Interfaces.

The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration

Hyungjun Kim, Hyungjun Kim, Hanearl Jung, 2014 .

Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides

Yong Ju Park, G. Ryu, Jong-Hyun Ahn, 2016, Scientific Reports.

n-ZnO:N/p-Si nanowire photodiode prepared by atomic layer deposition

Hyemin Kang, Hyungjun Kim, Kwang-H Lee, 2012 .

Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer

G. Ryu, J. Myoung, Z. Lee, 2015, Nature Communications.

Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors

I. Oh, J. Myoung, Soo‐Hyun Kim, 2017 .

Fabrication of transferable Al(2)O(3) nanosheet by atomic layer deposition for graphene FET.

I. Oh, Soo‐Hyun Kim, Taeyoon Lee, 2014, ACS applied materials & interfaces.

Synthesis of few-layered graphene nanoballs with copper cores using solid carbon source.

Ja Hoon Koo, Seulah Lee, Taeyoon Lee, 2013, ACS applied materials & interfaces.