Clément Lansalot-Matras

发表

Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

I. Oh, J. Myoung, Han-Bo-Ram Lee, 2016, Journal of Materials Science.

Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric

Min Kyu Kim, I. Oh, Hyungjun Kim, 2014 .

Dehydration of fructose into 5-hydroxymethylfurfural in the presence of ionic liquids

C. Moreau, Clément Lansalot-Matras, 2003 .

Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2

I. Oh, Han-Bo-Ram Lee, Y. Shin, 2016 .

Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate

Min Kyu Kim, David Thompson, I. Oh, 2014 .

The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition

Min Kyu Kim, David Thompson, I. Oh, 2013 .

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

C. Hwang, S. Kim, Sang Woon Lee, 2013 .

N-tripodal ligands to generate copper catalysts for the syndiotactic polymerization of methyl-methacrylate : Crystal structures of copper complexes

O. Lavastre, Clément Lansalot-Matras, E. Mignard, 2008 .

Acetyl-hydroxy-fulvene: A new ligand for chromium-catalyzed polymerization of ethylene at room temperature. Crystal structures of the ligands and chromium complex

O. Lavastre, Clément Lansalot-Matras, S. Sirol, 2015 .

Layer-controlled, wafer-scale, and conformal synthesis of tungsten disulfide nanosheets using atomic layer deposition.

J. Myoung, Soo‐Hyun Kim, Hyungjun Kim, 2013, ACS nano.

Methoxylation of methyl oleate in the presence of dealuminated Y faujasites in their protonic form

C. Moreau, Clément Lansalot-Matras, A. Finiels, 2006 .

Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition

I. Oh, Z. Lee, Hyungjun Kim, 2015 .

Atomic layer deposition of Y2O3 films using heteroleptic liquid (iPrCp)2Y(iPr-amd) precursor

Clément Lansalot-Matras, Y. Jung, Jinho Ahn, 2014 .

Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O.

C. Hwang, Sang Woon Lee, D. Cho, 2017, ACS applied materials & interfaces.

Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films

M. Ritala, M. Leskelä, K. Mizohata, 2016 .

Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer

G. Ryu, J. Myoung, Z. Lee, 2015, Nature Communications.

Synthesis and PEALD evaluation of new Nickel precursors

Clément Lansalot-Matras, J. Gatineau, Changhee Ko, 2014, IEEE International Interconnect Technology Conference.

Atomic layer deposition of B2O3/SiO2 thin films and their application in an efficient diffusion doping process

Min Kyu Kim, David Thompson, I. Oh, 2014 .