Thomas L. Laidig

发表

Contact hole reticle optimization by using interference mapping lithography (IML)

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

CPL mask technology for sub-100-nm contact hole imaging

Kevin D. Lucas, Christopher J. Progler, J. Fung Chen, 2004, Photomask Japan.

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

John S. Petersen, Stephen Hsu, Robert J. Socha, 2002, SPIE Advanced Lithography.

Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

Designing dual-trench alternating phase-shift masks for 140-nm and smaller features using 248-nm KrF and 193-nm ArF lithography

Martin McCallum, John S. Petersen, J. Fung Chen, 1998, Photomask and Next Generation Lithography Mask Technology.

RET integration of CPL technology for random logic

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

Manufacturing an advanced process characterization reticle incorporating halftone biasing

Kent H. Nakagawa, J. Fung Chen, Douglas J. Van Den Broeke, 1999, European Mask and Lithography Conference.

Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Photomask and Next Generation Lithography Mask Technology.

Resolution enhancement with high-transmission attenuating phase-shift masks

Will Conley, John S. Petersen, Robert J. Socha, 1999, Photomask and Next Generation Lithography Mask Technology.

Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)

Robert Socha, Stephen D. Hsu, Douglas J. Van Den Broeke, 2003, SPIE Photomask Technology.

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Tsann-Bim Chiou, Jo Finders, Eric Hendrickx, 2004, Photomask Japan.

Eigen-decomposition-based models for model OPC

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

CD error sensitivity to "sub-killer" defects at k1 near 0.4: II

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Photomask Technology.

OPC technology road map to 0.14-μm design rules

J. Fung Chen, Douglas J. Van Den Broeke, Kurt E. Wampler, 1997, Photomask Technology.

Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL)

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Technology.

Contact hole reticle optimization by using interference mapping lithography (IML)

Stephen D. Hsu, Robert J. Socha, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Ronald L. Gordon, Bruce W. Smith, Martin McCallum, 1999, Other Conferences.

65-nm full-chip implementation using double dipole lithography

Will Conley, Tsann-Bim Chiou, Jo Finders, 2003, SPIE Advanced Lithography.

Experimental verification of a model-based decomposition method for double dipole lithography

Geert Vandenberghe, Tsann-Bim Chiou, Alek Chen, 2004, SPIE Advanced Lithography.

Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography

Jung-Min Sohn, Sung-Woon Choi, J. Fung Chen, 2003, SPIE Photomask Technology.

Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Ronald L. Gordon, Bruce W. Smith, Martin McCallum, 1998, Photomask Technology.

Practical method for full-chip optical proximity correction

J. Fung Chen, Kurt E. Wampler, Roger F. Caldwell, 1997, Advanced Lithography.

Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node

J. Fung Chen, Stephen D. Hsu, Robert J. Socha, 2004, Photomask Japan.

Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL

J. Fung Chen, Stephen D. Hsu, Douglas J. Van Den Broeke, 2004, Photomask Japan.

Size matters: defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

Linard Karklin, Nigel R. Farrar, Roger F. Caldwell, 1998, Photomask Technology.

CD error sensitivity to "sub-killer" defects at k1 near 0.4

Kent H. Nakagawa, J. Fung Chen, Robert J. Socha, 1999, Advanced Lithography.

Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask

Stephen Hsu, J. Fung Chen, Douglas J. Van Den Broeke, 2002, Photomask Japan.

Making high-performance scattering-bar OPC masks with vector-scan, variable-shaped e-beam, and raster-scan laser mask writers

J. Fung Chen, Kurt E. Wampler, Roger F. Caldwell, 1998, Photomask Technology.

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Kevin D. Lucas, Fung Chen, 2004, SPIE Advanced Lithography.

Application of CPL reticle technology for the 65- and 50-nm node

Douglas J. Van Den Broeke, Kurt E. Wampler, Thomas L. Laidig, 2003, SPIE Advanced Lithography.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I

Robert John Socha, John S. Petersen, J. Fung Chen, 1998, Photomask Technology.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Will Conley, Christophe Pierrat, Robert John Socha, 1999, Advanced Lithography.