Wei Wu

发表

CPL mask technology for sub-100-nm contact hole imaging

Kevin D. Lucas, Christopher J. Progler, J. Fung Chen, 2004, Photomask Japan.

Application of Chromeless Phase Lithography (CPL) masks in ArF lithography

Will Conley, Christopher J. Progler, Robert J. Socha, 2002, Photomask Technology.

Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

The application of fiber grating sensor network in port-machinery monitoring

Xin Liu, Lei Liang, Wei Wu, 2010 .

RET integration of CPL technology for random logic

Will Conley, J. Fung Chen, Stephen D. Hsu, 2004, SPIE Advanced Lithography.

Toward the modulation of negative index materials (NIM) by photoconductive coupling

Wei Wu, Shih-Yuan Wang, Logeeswaran VJ, 2006, SPIE Optics East.

Infrared and visible images fusion by using sparse representation and guided filter

Awais Ahmad, Zuoyong Li, Wei Wu, 2020, J. Intell. Transp. Syst..

Applications of CPL mask technology for sub-65nm gate imaging

Will Conley, Jonathan Cobb, Doug van den Broeke, 2004, SPIE Advanced Lithography.

Characterization of printed CZTSSe films for photovoltaic applications

Wei Wu, Yanyan Cao, Jonathan V. Caspar, 2013, Optics & Photonics - Solar Energy + Applications.

Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Will Conley, John S. Petersen, Donis G. Flagello, 2002, SPIE Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

High-transmission mask technology for 45nm node imaging

Will Conley, Jonathan Cobb, Chris Progler, 2006, SPIE Advanced Lithography.

Integration of ultrathin resist processes into MPU IC manufacturing flows

Will Conley, Jonathan L. Cobb, Scott D. Hector, 2001, SPIE Advanced Lithography.

Fabrication of integrated circuits with high yield using ultra-thin resist processes

Jonathan L. Cobb, Scott D. Hector, Sergei V. Postnikov, 2003, SPIE Advanced Lithography.

Defect printability in CPL mask technology

Will Conley, Christopher J. Progler, Robert J. Socha, 2004, SPIE Advanced Lithography.

The hot stack performance of the shallow geothermal heat pump system with/without intensification state of groundwater seepage in Nanjing (China)

Dong Li, Wei Wu, Qihe Li, 2017 .

Integration of UTR processes into MPU IC manufacturing flows

Jonathan L. Cobb, Scott D. Hector, Wei Wu, 2002, SPIE Advanced Lithography.

The impact of illumination on feature fidelity for CPL mask technology

Will Conley, Chris Progler, Stephen Hsu, 2004, SPIE Advanced Lithography.

A novel design methodology for active shim coil

P. Yuan, Wei Wu, Lizhen Ma, 2012 .

Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Will Conley, John S. Petersen, David J. Gerold, 2002, SPIE Advanced Lithography.

A Novel Infrared Image Enhancement Based on Correlation Measurement of Visible Image for Urban Traffic Surveillance Systems

Zuoyong Li, Wei Wu, Xiaomin Yang, 2020, J. Intell. Transp. Syst..

Self-assembled microfabrication technology for 3D isotropic negative index material

David A. Horsley, Wei Wu, Mei-Lin Chan, 2006, SPIE Optics East.

CPL reticle technology for advanced device applications

Kevin D. Lucas, Philippe Thony, Christopher J. Progler, 2004, Photomask Japan.

Temperature field reconstruction of combustion flame based on high dynamic range images

Zhong Zhou, Zhaohui Wu, Yupeng Wang, 2013 .

Tunable laser using semiconductor optical amplifier and its application in fiber grating sensor system

Xin Liu, Wei Wu, Ruquan Xu, 2008, SPIE/OSA/IEEE Asia Communications and Photonics.

The application of CPL reticle technology for the 0.045-mm node

Will Conley, Kevin D. Lucas, Fung Chen, 2004, SPIE Advanced Lithography.

Challenges in 1 Teradot∕in.2 dot patterning using electron beam lithography for bit-patterned media

Wei Wu, Shuaigang Xiao, Kim Y. Lee, 2007 .

Alignment for imprint lithography using nDSE and shallow molds

Wei Wu, Zhaoning Yu, Carl Picciotto, 2009, Nanotechnology.

Overlay alignment using optical microscopy and arbitrary surface features

William M. Tong, Wei Wu, Eric Hoarau, 2005 .