Chun Zhao

Effects of hydrogen on positive charges in gate oxides

J. Zhang, Chun Zhao, 2005 .

Impact of different defects on the kinetics of negative bias temperature instability of hafnium stacks

M. Heyns, G. Groeseneken, A. Peaker, 2008 .

Hydrogen induced and plasma charging enhanced positive charge generation in gate oxides

R. Degraeve, G. Groeseneken, J. Zhang, 2000, 2000 5th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.00TH8479).

Threshold voltage instability of p-channel metal-oxide-semiconductor field effect transistors with hafnium based dielectrics

R. Degraeve, G. Groeseneken, J. Zhang, 2007 .

Determination of capture cross sections for as-grown electron traps in HfO2∕HfSiO stacks

Guido Groeseneken, Jian Fu Zhang, Bogdan Govoreanu, 2006 .

Process-induced positive charges in Hf-based gate stacks

M. Heyns, G. Groeseneken, A. Peaker, 2008 .

Impact of gate materials on positive charge formation in HfO2∕SiO2 stacks

R. Degraeve, G. Groeseneken, J. Zhang, 2006 .

On the activation and passivation of precursors for process-induced positive charges in Hf-dielectric stacks

M. Heyns, G. Groeseneken, Z. Ji, 2009 .

Analysis of the kinetics for interface state generation following hole injection

Guido Groeseneken, Robin Degraeve, Jian Fu Zhang, 2003 .