Masashi Ataka

CD measurement of angled lines on high-end masks and its calibration method

Masashi Ataka, Yasunobu Kitayama, Katsuyuki Takahashi, 2005, SPIE Photomask Technology.

CD measurement of points indicated in photomask writing data

Masashi Ataka, Hitomi Satoh, Norimichi Anazawa, 2005, SPIE Photomask Technology.

CD guarantee for the next-generation photomasks with CD-SEM

Hiroaki Morimoto, Masashi Ataka, Takayuki Iwamatsu, 1998, Photomask Technology.

Mask defect imaging system using backscattered electron images

Masashi Ataka, Katsuyuki Takahashi, Takao Namae, 2006, SPIE Photomask Technology.

Calibration and long-term stability evaluation of photo mask CD-SEM utilizing JQA standard

Masashi Ataka, Katsuyuki Takahashi, Izumi Santo, 2002, Photomask Technology.

Critical dimension guarantee for the next generation photomasks with critical dimension scanning electron microscope

Hiroaki Morimoto, Masashi Ataka, Takayuki Iwamatsu, 2001 .