Mitsuko Muroi

Quartz crystal microbalance for real-time monitoring chlorosilane gas transport in slim vertical cold wall chemical vapor deposition reactor

S. Hara, Toshinori Takahashi, Mana Otani, 2020 .

Real time evaluation of silicon epitaxial growth process by exhaust gas measurement using quartz crystal microbalance

S. Hara, Mitsuko Muroi, Miya Matsuo, 2018, Materials Science in Semiconductor Processing.

Advantages of a slim vertical gas channel at high SiHCl3 concentrations for atmospheric pressure silicon epitaxial growth

S. Hara, Mitsuko Muroi, Kenta Irikura, 2018, Materials Science in Semiconductor Processing.

Transport phenomena in a slim vertical atmospheric pressure chemical vapor deposition reactor utilizing natural convection

Ning Li, S. Hara, Mitsuko Muroi, 2017 .

Boron-Silicon Film Chemical Vapor Deposition Using Boron Trichloride, Dichlorosilane and Monomethylsilane Gases

Mana Otani, Mitsuko Muroi, Hitoshi Habuka, 2021 .

Silicon epitaxial growth accelerated by parallel Langmuir processes using SiH2Cl2 and SiH3CH3 gases

Mitsuko Muroi, Ayami Yamada, Hitoshi Habuka, 2018, Semiconductor Science and Technology.

Deposition and etching behaviour of boron trichloride gas at silicon surface

Mitsuko Muroi, Ayami Yamada, Hitoshi Habuka, 2020 .