D. Nest

发表

Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Dependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4F8- and CF4-based discharges

S. Engelmann, R. Bruce, D. Graves, 2009 .

Comparing 193 nm photoresist roughening in an inductively coupled plasma system and vacuum beam system

D. Graves, D. Nest, M. Titus, 2009 .

Dependence of Polymer Surface Roughening Rate on Deposited Energy Density During Plasma Processing

S. Engelmann, R. Bruce, D. Graves, 2009 .

Modelling vacuum ultraviolet photon penetration depth and C=O bond depletion in 193 nm photoresist

D. Graves, D. Nest, M. Titus, 2009 .

Ar+ bombardment of 193nm photoresist: Morphological effects

D. Graves, E. Pargon, D. Nest, 2007 .

Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2008 .

Absolute vacuum ultraviolet flux in inductively coupled plasmas and chemical modifications of 193 nm photoresist

D. Graves, D. Nest, M. Titus, 2009 .

Photoresist modifications by plasma vacuum ultraviolet radiation: The role of polymer structure and plasma chemistry

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2010 .

Plasma-surface interactions of model polymers for advanced photoresists using C4F8∕Ar discharges and energetic ion beams

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2007 .

Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Plasma-surface interactions of advanced photoresists with C4F8∕Ar discharges: Plasma parameter dependencies

David B. Graves, Robert L. Bruce, Sebastian Engelmann, 2009 .

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

David B. Graves, Robert L. Bruce, C. G. Willson, 2010 .

Near-surface modification of polystyrene by Ar+: Molecular dynamics simulations and experimental validation

S. Engelmann, C. Willson, R. Bruce, 2007 .

Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

David B. Graves, Robert L. Bruce, Gottlieb S. Oehrlein, 2010 .

Molecular dynamics simulations of near-surface modification of polystyrene : Bombardment with Ar+ and Ar+/radical chemistries

S. Engelmann, C. Willson, R. Bruce, 2008 .