K. Hashimoto

RESIST HEATING EFFECT IN ELECTRON BEAM LITHOGRAPHY

Y. Hirai, K. Murata, H. Kawata, 1994 .

Tailored Glass Transition of ArF Resists for Resolution Enhancement at sub-50nm node

I. Yoshida, K. Hashimoto, Youngjoon Lee, 2005 .

Application of Ferroelectric BST Thin Film Prepared by MOD for Uncooled Infrared Sensor of Dielectric Bolometer Mode

Minoru Noda, Masanori Okuyama, Hong Zhu, 2000 .

Preparation of BST ferroelectric thin film by pulsed laser ablation for dielectric bolometers

Minoru Noda, Masanori Okuyama, Hong Zhu, 2000 .

A new type of dielectric bolometer mode of detector pixel using ferroelectric thin film capacitors for infrared image sensor

Minoru Noda, Masanori Okuyama, Kazuhiko Hashimoto, 1999 .

New type of dielectric bolometer mode of detector pixel using ferroelectric thin film capacitors for an infrared image sensor

Minoru Noda, Masanori Okuyama, Kazuhiko Hashimoto, 1998, Optics & Photonics.

Effect of fluorinated monomer unit introduction to KrF resin system in F2 lithography

Isao Yoshida, Kazuhiko Hashimoto, Yoshiko Miya, 2001, SPIE Advanced Lithography.

Novel Silicon-Containing Negative Resist for Bilayer Application in Electron Beam Direct Writing

Masaru Sasago, Masayuki Endo, Kazuhiko Hashimoto, 1993 .