R. Jonckheere
发表
U. Hofmann,
L. Leunissen,
R. Jonckheere,
2004
.
F. Scholze,
E. Hendrickx,
R. Jonckheere,
2020
.
Jeroen Van de Kerkhove,
Han-Ku Cho,
Joo-Tae Moon,
2006,
European Mask and Lithography Conference.
R. Jonckheere,
V. Rangelov,
A. Poelaert,
2001
.
F. V. Roey,
A. Goethals,
R. Jonckheere,
2003
.
Karen Maex,
Herbert Struyf,
Michele Stucchi,
2004
.
E. Rosseel,
K. Temst,
V. Metlushko,
1998
.
V. Metlushko,
V. Moshchalkov,
R. Jonckheere,
1994
.
C. V. Haesendonck,
C. Strunk,
V. Moshchalkov,
1995,
Nature.
V. Metlushko,
V. Moshchalkov,
R. Jonckheere,
1995
.
J. Swerts,
R. Jonckheere,
Helmut Fritzsche,
2005
.
K. Temst,
R. Jonckheere,
E. Popova,
2005
.
J. Swerts,
K. Temst,
C. V. Haesendonck,
2004
.
J. Swerts,
K. Temst,
C. V. Haesendonck,
2003
.
K. Temst,
R. Jonckheere,
E. Popova,
2005
.
J. Swerts,
J. Bekaert,
K. Temst,
2003
.
M. Roukes,
H. Grubin,
M. Kozicki,
1989
.
C. V. Haesendonck,
C. Strunk,
V. Moshchalkov,
1994
.
C. V. Haesendonck,
V. Moshchalkov,
R. Jonckheere,
1993
.
R. Jonckheere,
T. Bret,
C. Baur,
2012
.
K. Temst,
I. Gordon,
R. Jonckheere,
2003,
Physical review letters.
T. Puig,
V. Moshchalkov,
R. Jonckheere,
1999,
cond-mat/9905093.
V. Moshchalkov,
R. Jonckheere,
V. Bruyndoncx,
2001,
cond-mat/0105454.
Kurt G. Ronse,
Rik Jonckheere,
Leonardus H. A. Leunissen,
2003
.
Puneet Gupta,
Yoo-Jin Chae,
Rik Jonckheere,
2018,
Photomask Technology.
M. V. Hove,
G. Borghs,
W. Schoenmaker,
1992
.
S. Decoutere,
D. Lanneer,
R. Jonckheere,
1986
.
Linard Karklin,
Vicky Philipsen,
Rik M. Jonckheere,
2002,
SPIE Advanced Lithography.
K. Temst,
R. Jonckheere,
S. Brems,
2006
.
K. Temst,
V. Moshchalkov,
R. Jonckheere,
2002
.
Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance
Uwe Dietze,
Peter Dress,
Rik Jonckheere,
2011,
European Mask and Lithography Conference.
Rik Jonckheere,
L. V. Hove,
R. Jonckheere,
1995
.
Tristan Bret,
Markus Waiblinger,
Rik Jonckheere,
2012,
Photomask Technology.
Tristan Bret,
R. Jonckheere,
D. Van den Heuvel,
2012,
Other Conferences.
T. Bret,
R. Jonckheere,
D. Van den Heuvel,
2012,
Advanced Lithography.
G. Vandenberghe,
I. Pollentier,
R. Gronheid,
2013
.
R. Watso,
U. Okoroanyanwu,
A. Goethals,
2004
.
V. Metlushko,
V. Moshchalkov,
R. Jonckheere,
1995,
Physical review letters.
K. Temst,
C. Strunk,
V. Moshchalkov,
1994
.
M. V. Hove,
G. Borghs,
L. V. Hove,
1989
.
P. Jansen,
G. Borghs,
R. Jonckheere,
1991
.
Jae Uk Lee,
Christoph Adelmann,
Houman Zahedmanesh,
2015,
SPIE Photomask Technology.
J. Bekaert,
I. Pollentier,
E. Gallagher,
2023,
Advanced Lithography.
E. Rosseel,
K. Temst,
V. Metlushko,
1996,
Physical review. B, Condensed matter.