C. Hohle
发表
C. Hohle,
Katja Keil,
Johannes Kretz,
2009
.
Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions
Andrew R. Romano,
F. Houlihan,
C. Hohle,
2005
.
D. Haarer,
H. Schmidt,
M. Thelakkat,
1999
.
Christoph Hohle,
Stefan Schloter,
Dietrich Haarer,
1998,
Optics & Photonics.
László Szikszai,
Philipp Jaschinsky,
Katja Keil,
2009,
Advanced Lithography.
M. Freitag,
J. Paul,
C. Hohle,
2013
.
W. Weinreich,
J. Paul,
J. Sundqvist,
2013,
2013 International Semiconductor Conference Dresden - Grenoble (ISCDG).
Christoph Hohle,
Manuela Gutsch,
Patrick Schiavone,
2012,
Photomask Technology.
Stephan J. Zilker,
D. Haarer,
M. Thelakkat,
1999
.
Stephan J. Zilker,
M. Grasruck,
D. Haarer,
1999
.
Stephan J. Zilker,
M. Grasruck,
P. Strohriegl,
2001
.
J. Martínez‐Pastor,
C. Hohle,
C. Zapata-Rodriguez,
2014,
2014 16th International Conference on Transparent Optical Networks (ICTON).
Stephan J. Zilker,
M. Grasruck,
D. Haarer,
1999
.
C. Hohle,
R. Galler,
K.-H. Choi,
2011,
European Mask and Lithography Conference.
C. Hohle,
R. Galler,
K.-H. Choi,
2010,
Photomask Technology.
Philipp Jaschinsky,
Katja Keil,
Marc Hauptmann,
2010,
European Mask and Lithography Conference.
C. Hohle,
M. Grasruck,
Stephan J. Zilker,
1999
.