D. Rio

5 kV multielectron beam lithography: MAPPER tool and resist process characterization

L. Pain, B. Icard, Christophe Constancias, 2010 .

Electron Beam Lithography

D. Rio, C. Constancias, L. Pain, 2013 .

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

V. Philipsen, R. Kim, D. Rio, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

Influence of process parameters on hydrogen silsesquioxane chemistry at low voltage electron beam exposures

L. Pain, B. Icard, Christophe Constancias, 2010 .