Karen Petrillo

Exploration of pillar local CDU improvement options for AI applications (Conference Presentation)

Nelson Felix, Hao Tang, Chi-Chun Liu, 2020 .

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Joe Lee, Akiteru Ko, Cody Murray, 2020, Advanced Lithography.

Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Nelson Felix, Ravi Bonam, Mary Breton, 2020 .

Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch

Nelson Felix, Ravi Bonam, Mary Breton, 2020, Advanced Lithography.