D. Olynick

发表

Nanoscale molecular-switch devices fabricated by imprint lithography

Erik H. Anderson, R. Stanley Williams, J. Fraser Stoddart, 2003 .

One-kilobit cross-bar molecular memory circuits at 30-nm half-pitch fabricated by nanoimprint lithography

D. Ohlberg, R. Williams, W. Tong, 2005 .

20-nm-resolution Soft x-ray microscopy demonstrated by use of multilayer test structures

E. Anderson, W. Chao, F. Salmassi, 2003 .

Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Kim Y. Lee, I. Rangelow, S. Cabrini, 2018, Nanotechnology.

Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices.

S. Cabrini, S. Dhuey, D. Olynick, 2010, Nanotechnology.

Fabrication of 30 nm pitch imprint moulds by frequency doubling for nanowire arrays

Gun Young Jung, R. Stanley Williams, William M. Tong, 2006 .

Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymers.

Xiaogan Liang, Nobuya Hiroshiba, Sang-Min Park, 2011, ACS nano.

Cryogenic etching of nano-scale silicon trenches with resist masks

Stefano Cabrini, Andy Goodyear, Christophe Peroz, 2011 .

Pattern-generation and pattern-transfer for single-digit nano devices

Teodor Gotszalk, Ivo W. Rangelow, Ivaylo Atanasov, 2016 .

Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithography

P. Ashby, D. Olynick, P. Kulshreshtha, 2014, Nanotechnology.

Obtaining nanoimprint template gratings with 10 nm half-pitch by atomic layer deposition enabled spacer double patterning

G. Calafiore, S. Cabrini, S. Dhuey, 2013, Nanotechnology.

Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablation.

D. Kern, P. Schuck, S. Cabrini, 2020, Nanoscale.

Probe field enhancement in photonic crystals by upconversion nanoparticles

Xiaogan Liang, P. Schuck, S. Cabrini, 2011 .

Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.

Vincent S. D. Voet, D. F. Ogletree, Sang-Min Park, 2011, Journal of the American Chemical Society.

Low temperature dry etching of chromium towards control at sub-5 nm dimensions

Kim Y. Lee, I. Rangelow, Xiaoming Yang, 2016, Nanotechnology.

Mainstreaming inorganic metal-oxide resists for high-resolution lithography

A. Schwartzberg, D. Keszler, D. Olynick, 2016 .

SELECTIVE LASER ABLATION IN RESISTS AND BLOCK COPOLYMERS FOR HIGH RESOLUTION LITHOGRAPHIC PATTERNING

Nathan D. Jarnagin, I. Rangelow, T. Russell, 2015 .

Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine film.

Y. Jung, Xiaogan Liang, S. Cabrini, 2010, ACS nano.

Anomalous Desorption of Copper Oxide Observed by In Situ Transmission Electron Microscopy

D. Olynick, J. Gibson, J. C. Yang, 1997, Microscopy and Microanalysis.

Formation of bandgap and subbands in graphene nanomeshes with sub-10 nm ribbon width fabricated via nanoimprint lithography.

Jeffrey Bokor, Stefano Cabrini, Shiwei Wu, 2010, Nano letters.

In-situ observations of classical grain growth mechanisms during sintering of copper nanoparticles on (001) copper

J. Bullard, R. Averback, D. Olynick, 1997 .

Studies of Ordering in Small Particles

R. Averback, U. Herr, D. Olynick, 1995 .

Complex Materials by Atomic Layer Deposition

A. Schwartzberg, D. Olynick, 2015, Advanced materials.

Investigation of phonon coherence and backscattering using silicon nanomeshes

S. Cabrini, P. Yang, Jaeho Lee, 2017, Nature Communications.

Impurity-suppressed sintering in copper nanophase materials

R. Averback, D. Olynick, J. Gibson, 1998 .

Fundamental understanding of chemical processes in extreme ultraviolet resist materials.

Patrick Naulleau, Yi Liu, Bo Xu, 2018, The Journal of chemical physics.

A route for fabricating printable photonic devices with sub-10 nm resolution

G. Calafiore, S. Cabrini, V. Lacatena, 2013, Nanotechnology.

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Demonstration of 20 nm half-pitch spatial resolution with soft x-ray microscopy

Farhad Salmassi, David T. Attwood, Bruce Harteneck, 2003 .

The influence of sub-100 nm scattering on high-energy electron beam lithography

Erik H. Anderson, Bruce Harteneck, Eugene Veklerov, 2001 .

Roller-style electrostatic printing of prepatterned few-layer-graphenes

Xiaogan Liang, A. Ismach, S. Cabrini, 2010 .

Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography.

R Stanley Williams, Shih-Yuan Wang, R. Williams, 2005, Langmuir : the ACS journal of surfaces and colloids.

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Xiaodan Gu, Deirdre L. Olynick, Simone Sassolini, 2014, Nanotechnology.

In situ ultra-high vacuum transmission electron microscopy studies of nanocrystalline copper

R. Averback, D. Olynick, J. Gibson, 1995 .

Trace oxygen effects on copper nanoparticle size and morphology

R. Averback, D. Olynick, J. Gibson, 1996 .

Sintering of sputtered copper nanoparticles on (001) copper substrates

R. Averback, D. Olynick, M. Ghaly, 1996 .

Single digit nanofabrication by step-and-repeat nanoimprint lithography

S. Cabrini, S. Dhuey, D. Olynick, 2012, Nanotechnology.

Super-selective cryogenic etching for sub-10 nm features

Bruce Harteneck, Deirdre Olynick, B. Harteneck, 2013, Nanotechnology.

Electrostatic force assisted exfoliation of prepatterned few-layer graphenes into device sites.

Xiaogan Liang, Yuegang Zhang, S. Cabrini, 2009, Nano letters.

Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale.

I. Rangelow, D. Olynick, D. Staaks, 2018, Nanoscale.

Signal propagation in dipole coupled nanomagnets for logic applications

Ilya Krivorotov, Jeffrey Bokor, Li Gao, 2012, Other Conferences.

Nanofabrication and diffractive optics for high-resolution x-ray applications

Erik H. Anderson, David T. Attwood, Bruce Harteneck, 2000 .

Static EUV micro-exposures using the ETS Set-2 optics

Kenneth A. Goldberg, Sherry L. Baker, Patrick P. Naulleau, 2003, SPIE Advanced Lithography.

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

Nanoscale pattern transfer for templates, NEMS, and nano-optics

Ivo W. Rangelow, Bruce Harteneck, Stefano Cabrini, 2007, SPIE MOEMS-MEMS.

Profile evolution of Cr masked features undergoing HBr-inductively coupled plasma etching for use in 25 nm silicon nanoimprint templates

I. Rangelow, J. Liddle, D. Olynick, 2005 .

Electron beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in-situ electron beam induced desorption

D. Olynick, D. L. Olynick, D. Ogletree, 2009 .

Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

Xiaogan Liang, S. Cabrini, S. Dhuey, 2011 .

Fabrication of a 34 × 34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography

Gun Young Jung, R. Stanley Williams, William M. Tong, 2004 .

Understanding the base development mechanism of hydrogen silsesquioxane

W. Chao, Xiaogan Liang, D. Olynick, 2009 .

The link between nanoscale feature development in a negative resist and the Hansen solubility sphere

W. Chao, J. Liddle, P. Ashby, 2009 .

High Aspect Ratio Sub‐15 nm Silicon Trenches From Block Copolymer Templates

Xiaodan Gu, X. Gu, T. Russell, 2012, Advanced materials.

Experimental analysis of high-resolution soft x-ray microscopy

David T. Attwood, Bruce Harteneck, Gregory Denbeaux, 2001, SPIE Optics + Photonics.

Profile simulation model for sub-50 nm cryogenic etching of silicon using SF6/O2 inductively coupled plasma

Ivo W. Rangelow, Deirdre L. Olynick, Valentyn Ishchuk, 2015 .

Toward an integrated device for spatiotemporal superposition of free-electron lasers and laser pulses.

Laura Foglia, Marco Lazzarino, Scott Dhuey, 2016, Optics letters.

Device fabrication and transport measurements of FinFETs built with 28Si SOI wafers toward donor qubits in silicon

H. Bechtel, J. Bokor, A. Persaud, 2009, 0906.1995.

Scanning x-ray microscopy investigations into the electron-beam exposure mechanism of hydrogen silsesquioxane resists

T. Tyliszczak, F. Salmassi, S. Leone, 2006 .

Kinetic Investigations of the Initial Oxidation Stage of Copper by In-Situ UHV-TEM

D. Olynick, B. Kolasa, J. Gibson, 1996 .

Resist Materials for Extreme Ultraviolet Lithography: Toward Low‐Cost Single‐Digit‐Nanometer Patterning

Patrick P Naulleau, D. F. Ogletree, P. Naulleau, 2015, Advanced materials.

25 nm mechanically buttressed high aspect ratio zone plates: Fabrication and performance

Bruce Harteneck, Eugene Veklerov, Deirdre L. Olynick, 2004 .

Plasma-enhanced atomic layer deposition for plasmonic TiN

Adam M. Schwartzberg, Scott Dhuey, Deirdre L. Olynick, 2016, NanoScience + Engineering.

Issues on nanoimprint lithography with a single-layer resist structure

D. Ohlberg, W. Tong, G. Jung, 2005 .

Demonstration of 12 Nm Resolution Fresnel Zone Plate Lens Based Soft X-ray Microscopy Identifying and Monitoring Effects of Lens Aberrations in Projection Printing, " in Optical Microlithography

E. Veklerov, J. Kirz, O. Bunk, 2022 .

Cross-linked polymer replica of a nanoimprint mold at 30 nm half-pitch.

J Alexander Liddle, Haixiong Ge, R Stanley Williams, 2005, Nano letters.

Investigation of phonon coherence and backscattering using silicon nanomeshes

S. Cabrini, P. Yang, Jaeho Lee, 2017, Nature Communications.

Polymer-metal coating for high contrast SEM cross sections at the deep nanoscale.

I. Rangelow, D. Olynick, D. Staaks, 2018, Nanoscale.

Complex Materials by Atomic Layer Deposition

A. Schwartzberg, D. Olynick, 2015, Advances in Materials.

Self-collimation of light over millimeter-scale distance in a quasi-zero-average-index metamaterial.

S. Cabrini, I. Rendina, B. Harteneck, 2009, Physical review letters.