V. Vahedi

发表

Simultaneous Potential and Circuit Solution for Two-Dimensional Bounded Plasma Simulation Codes

V. Vahedi, G. Dipeso, 1997 .

Verification of frequency scaling laws for capacitive radio‐frequency discharges using two‐dimensional simulations*

M. Lieberman, C. Birdsall, T. Rognlien, 1993 .

Etching of Semiconductor Devices

R. Gottscho, V. Vahedi, T. Lill, 2019 .

Ion energy distributions in rf sheaths; review, analysis and simulation

M. Lieberman, C. Birdsall, V. Vahedi, 1999 .

Overview of atomic layer etching in the semiconductor industry

R. Gottscho, S. Sriraman, V. Vahedi, 2015 .

Modeling Electronegative Plasma Discharges

A. Lichtenberg, M. Lieberman, T. Rognlien, 1993 .

Semiempirical profile simulation of aluminum etching in a Cl2/BCl3 plasma

Richard A. Gottscho, Vahid Vahedi, R. Gottscho, 2002 .

Capacitive RF discharges modelled by particle-in-cell Monte Carlo simulation. I. Analysis of numerical techniques

Charles K. Birdsall, V. Vahedi, Michael A. Lieberman, 1993 .

Sheath voltage ratio for asymmetric RF discharges

M. Lieberman, C. Birdsall, V. Vahedi, 1990, 1990 Plasma Science IEEE Conference Record - Abstracts.

Plasma-assisted thermal atomic layer etching of Al2O3

Andreas Fischer, Richard A. Gottscho, Yang Pan, 2017, Advanced Lithography.

Atomic Layer Etching: Benefits and Challenges

R. Gottscho, V. Vahedi, T. Lill, 2018, 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM).

Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si

Harmeet Singh, Eray S. Aydil, Vahid Vahedi, 2002 .

Two‐dimensional self‐consistent fluid simulation of radio frequency inductive sources

T. Rognlien, V. Vahedi, G. Dipeso, 1994 .

Photoresist trimming: Etch solutions to CD uniformity and tuning

V. Vahedi, S. Ramalingam, Chris Lee, 2002 .

Capacitive RF discharges modelled by particle-in-cell Monte Carlo simulation. II. Comparisons with laboratory measurements of electron energy distribution functions

M. Lieberman, C. Birdsall, V. Vahedi, 1993 .

Analytic sheath resolution in high density plasma source simulations

V. Vahedi, G. Dipeso, 1995 .

Effect of gamma radiation on the optical and structural properties of ZnO nanowires with various diameters

A. Gholizadeh, A. Reyhani, V. Vahedi, 2018 .

Atomic Layer Etching: Directional

R. Gottscho, V. Vahedi, T. Lill, 2016 .

Ion energy distributions in rf sheaths; review, analysis and simulation

M. Lieberman, C. Birdsall, V. Vahedi, 1999 .

Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks

E. Aydil, Harmeet Singh, V. Vahedi, 2002 .

Modeling and Simulation of RF Discharges Used for Plasma Processing.

V. Vahedi, 1993 .

A Monte Carlo collision model for the particle-in-cell method: applications to argon and oxygen discharges

Maheswaran Surendra, V. Vahedi, M. Surendra, 1995 .

An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors

E. Aydil, Tae won Kim, V. Vahedi, 2002 .

Simultaneous potential and circuit solution for 1D bounded plasma particle simulation codes

John P. Verboncoeur, Charles K. Birdsall, V. Vahedi, 1990 .

Physical and numerical methods of speeding up particle codes and paralleling as applied to RF discharges

Charles K. Birdsall, Vahid Vahedi, C. Birdsall, 2000 .

Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon

E. Aydil, Tae won Kim, V. Vahedi, 2003 .

New diagnostic method for monitoring plasma reactor walls: Multiple total internal reflection Fourier transform infrared surface probe

E. Aydil, V. Vahedi, Erik A. Edelberg, 2001 .

A one‐dimensional collisional model for plasma‐immersion ion implantation

M. Lieberman, C. Birdsall, V. Vahedi, 1991 .

Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

Eray S. Aydil, Vahid Vahedi, E. Aydil, 2002 .

Analytic model of power deposition in inductively coupled plasma sources

Dennis W. Hewett, G. DiPeso, V. Vahedi, 1995 .

High selectivity plasma etching of silicon dioxide with a dual frequency 27/2 MHz capacitive radio frequency discharge

B. Frazier, V. Vahedi, G. Mueller, 1996 .

Dry etching in the presence of physisorption of neutrals at lower temperatures

Jane P. Chang, I. Berry, V. Vahedi, 2023, Journal of Vacuum Science & Technology A.

A collisional model for plasma immersion ion implantation

M. Lieberman, V. Vahedi, J. Verboncoeur, 1990, 1990 Plasma Science IEEE Conference Record - Abstracts.

Applying sputtering theory to directional atomic layer etching

R. Gottscho, I. Berry, V. Vahedi, 2018 .

Highly Selective Directional Atomic Layer Etching of Silicon

R. Gottscho, Wenbing Yang, V. Vahedi, 2015 .

Analytic model of the ion angular distribution in a collisional sheath

M. Lieberman, V. Vahedi, R. Stewart, 1993 .

Patterning in the era of atomic scale fidelity

Richard A. Gottscho, Jeffrey Marks, Yoshie Kimura, 2015, Advanced Lithography.

Advanced process control for poly-Si gate etching using integrated CD metrology

Thaddeus Gerard Dziura, Ady Levy, Gowri P. Kota, 2003, SPIE Advanced Lithography.

Synthesis and Characterization of ZnO Nanowires by Thermal Oxidation of Zn Thin Films at Various Temperatures

A. Reyhani, V. Vahedi, M. Khanlary, 2012, Molecules.

The influence of post-etch InGaAs fin profile on electrical performance

M. A. Pourghaderi, J. Geypen, H. Bender, 2013 .

PLASMA IMMERSION ION IMPLANTATION (PIII) FOR INTEGRATED CIRCUIT MANUFACTURING; THIRD QUARTERLY PROGRESS REPORT

M. Lieberman, N. Cheung, M. Kiang, 2015 .

Equilibrium profiles for RF-plasma sources with ponderomotive forces

T. Rognlien, V. Vahedi, G. Dipeso, 1995 .