K. Ashtiani

A two‐dimensional particle‐in‐cell simulation of an electron‐cyclotron‐resonance etching tool

N. Hershkowitz, J. Shohet, K. Ashtiani, 1995 .

Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization

K. Ashtiani, G. C. D'Couto, P. Rymer, 2000 .

The electrostatic potentials in an electron-cyclotron-resonance processing plasma

F. Anderson, J. Shohet, K. Ashtiani, 1992 .

Computer calculation of neutral-radical densities in a CF4 electron cyclotron resonance plasma processing system

J. Shohet, K. Ashtiani, R. Harvey, 1993 .