Seung-Min Shin

One-Step Etching Characteristics of ITO/Ag/ITO Multilayered Electrode in High-Density and High-Electron-Temperature Plasma

H. Cho, Howon Yoon, Seung-Min Shin, 2021, Materials.

A single gas barrier layer of high-density Al2O3 formed by neutral beam-assisted sputtering at room temperature

Seung-Min Shin, M. Hong, YunSung Jang, 2019, Thin Solid Films.