J. Strümpfel

发表

Reactive d.c. high-rate sputtering as production technology

S. Schiller, U. Heisig, C. Korndörfer, 1987 .

Deposition of TCO films by reactive magnetron sputtering from metallic Zn:Al alloy targets

M. Oertel, R. Menner, J. Strümpfel, 2003 .

Equipment, materials and processes: a review of high rate sputtering technology for glass coating

J. Strümpfel, S. Nadel, P. Greene, 2003 .

The effect of target-substrate coupling on reactive direct current magnetron sputtering

S. Schiller, U. Heisig, C. Korndörfer, 1989 .

On the investigation of d.c. plasmatron discharges by optical emission spectrometry

R. Fendler, S. Schiller, U. Heisig, 1982 .

Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

S. Schiller, U. Heisig, K. Steinfelder, 1979 .

Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

S. Schiller, U. Heisig, C. Korndörfer, 1984 .

Optical investigations in a PEM controlled reactive magnetron sputter process for aluminium doped zinc oxide layers using metallic alloy targets

J. Strümpfel, T. Wallendorf, C. May, 2003 .

ITO coating by reactive magnetron sputtering-comparison of properties from DC and MF processing

C May, J. Strümpfel, C. May, 1999 .

Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode

C May, J. Strümpfel, C. May, 2000 .