L. C. Kalutarage

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

T. J. Knisley, L. C. Kalutarage, C. Winter, 2013 .

Metallic Materials Deposition: Metal‐Organic PrecursorsUpdate based on the original article by Charles H. Winter, Wenjun Zheng and Hani M. El‐Kaderi, Encyclopedia of Inorganic Chemistry Second Edition, © 2005, John Wiley & Sons, Ltd.

T. J. Knisley, L. C. Kalutarage, C. Winter, 2012 .

Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent

L. C. Kalutarage, C. Winter, S. Clendenning, 2014 .

Volatile and thermally stable mid to late transition metal complexes containing α-imino alkoxide ligands, a new strongly reducing coreagent, and thermal atomic layer deposition of Ni, Co, Fe, and Cr metal films.

L. C. Kalutarage, C. Winter, Philip D. Martin, 2013, Journal of the American Chemical Society.

Synthesis, structure, and solution reduction reactions of volatile and thermally stable mid to late first row transition metal complexes containing hydrazonate ligands.

L. C. Kalutarage, C. Winter, Philip D. Martin, 2013, Inorganic chemistry.

Volatility and high thermal stability in mid-to-late first-row transition-metal complexes containing 1,2,5-triazapentadienyl ligands.

L. C. Kalutarage, C. Winter, Philip D. Martin, 2013, Inorganic chemistry.