J. Woo

发表

The Etch Characteristics of TiN Thin Film Surface in the CH 4 Plasma

Gwan-Ha Kim, Chang-I. Kim, D. Um, 2008 .

Etching characteristics and mechanisms of the MgO thin films in the CF4/Ar inductively coupled plasma

Gwan-Ha Kim, Chang-I. Kim, A. Efremov, 2007 .

Coherent phonons in a semiconductor superlattice studied by femtosecond X-ray diffraction

T. Elsaesser, J. Woo, M. Woerner, 2005, Quantum Electronics and Laser Science Conference.

Coherent Atomic Motions in a Nanostructure Studied by Femtosecond X-ray Diffraction

D. S. Kim, M. Bargheer, Y. Gritsai, 2004, Science.

Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method

Gwan-Ha Kim, Mi-Jin Jin, Jungmin Park, 2021, Crystals.

A Study of the Surface Chemical Reactions on IGZO Thin Film in BCl3/Ar Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

The dry etching of a sol–gel deposited ZnO thin film in a high density BCl3/Ar plasma

Chang-I. Kim, J. Woo, Dooseung Um, 2010 .

Save energy on OLED lighting by a simple yet powerful technique

Joo Yeon Kim, Jeong-Ik Lee, H. Chu, 2015 .

The periodically negative semi-pyramid nanostructured polymer layer for broadband anti-reflection effect

Joo Yeon Kim, Chang-I. Kim, J. Woo, 2012 .

Surface properties of ZrO2 thin film under Cl2/Ar plasma using angle-resolved X-ray photoelectron spectroscopy

Woo-Seok Yang, Chang-I. Kim, J. Woo, 2014 .

Etch characteristics of HfO2 thin films by using CF4/Ar inductively coupled plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

A Surface Properties of ZrO2 Thin Films Using Adaptively Coupled Plasma Source

Chang-I. Kim, J. Woo, 2011 .

A study on dry etching for profile and selectivity of ZrO2 thin films over Si by using high density plasma

J. Koo, Sang-Gi Kim, Gwan-Ha Kim, 2009 .

Etch Characteristics of ZrO2 Thin Films in High Density Plasma

Gwan-Ha Kim, Chang-I. Kim, D. Um, 2009 .

Improving the Etch Selectivity of ZrO2 Thin Films over Si by Using High Density Plasma

Gwan-Ha Kim, Chang-I. Kim, D. Um, 2009 .

The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Etching Properties of HfO2 Thin Films in Cl2/BCl3/Ar Plasma

Gwan-Ha Kim, Chang-I. Kim, D. Um, 2009 .

Dry Etching Mechanisms of ZrO2 Thin Films in BCl3/Cl2/Ar Plasma

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2009 .

Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma

Chang-I. Kim, J. Woo, C. Choi, 2013 .

Dry etch properties of IZO thin films in a CF4/Ar adaptively coupled plasma system

Chang-I. Kim, J. Woo, 2012 .

The Dry Etching Properties of HfAlO3 Thin Films over Si and SiO2 Using Inductively Coupled Plasma Source

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Surface Chemical Reaction on HfO2 Thin Film Etched by High Density Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Etch characteristics of TiN/Al2O3 thin film by using a Cl2/Ar adaptive coupled plasma

Chang-I. Kim, J. Woo, Seung-Han Kim, 2011 .

Etch Characterization of TiO$_{2}$ Thin Films Using Metal–Insulator–Metal Capacitor in Adaptively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2011 .

Dry etching of TaN thin film using CH4/Ar inductively coupled plasma

Chang-I. Kim, J. Woo, 2011 .

Ferroelectric properties of Bi3.25La0.75Ti3O12 films using HfO2 as buffer layers for nonvolatile-memory field-effect transistors

Gwan-Ha Kim, J. Woo, Kyoung-Tae Kim, 2008 .

Etch Properties of HfO 2 Thin Films using CH 4 /Ar Inductively Coupled Plasma

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2007 .

Etch Properties of Hf-Based High- k Dielectrics Using Inductively Coupled Plasma

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2007 .

Dry Etch Properties of ZTO Thin Films Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Dry Etching of ITO Thin Films by the Addition of Gases in Cl 2 /BCl 3 Inductivity Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

Surface treatments of indium tin oxide films by using high density plasma

Chang-I. Kim, J. Woo, Jae-Hyung Wi, 2011 .

Surface properties of etched ITO thin films using high density plasma

Chang-I. Kim, D. Um, J. Woo, 2010 .

The Etching Properties of Al2O3 Thin Films in BCl3/Cl2/Ar Plasma

Xueyang, Gwan-Ha Kim, Chang-I. Kim, 2009 .

Effects of N2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics

L. Do, K. No, K. Baek, 2010 .

Dry Etching Characteristics of Zinc Oxide Thin Films in Cl 2 -Based Plasma

Chang-I. Kim, J. Park, J. Woo, 2011 .

Dry etching of TiN in N2/Cl2/Ar adaptively coupled plasma

Kwangsoo Kim, L. Do, K. Baek, 2011 .

The Dry Etching Properties on TiN Thin Film Using an N 2 /BCl 3 /Ar Inductively Coupled Plasma

Chang-I. Kim, J. Park, J. Woo, 2011 .

Dry Etching Properties of HfAlO 3 Thin Film with Addition O 2 gas Using a High Density Plasma

J. Woo, Yong-Bong Lee, Jeong-Ho Kim, 2014 .

A study on the etch characteristics of HfAlO3 dielectric thin film in Cl2/Ar gas chemistry using inductively coupled plasma system

Chang-I. Kim, Juyun Park, Yong‐Cheol Kang, 2011 .

A study of the surface reaction on the etched ITO thin films by using inductively coupled plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Etching Properties of ZnS:Mn Thin Films in an Inductively Coupled Plasma

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2008 .

Dry Etching Properties of TiO 2 Thin Film Using Inductively Coupled Plasma for Resistive Random Access Memory Application

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

Dry Etching Characteristics of ZnO Thin Films for the Optoelectronic Device by Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma

Gwan-Ha Kim, J. Woo, Dong-pyo Kim, 2022, Transactions on Electrical and Electronic Materials.

Dry Etching of Al 2 O 3 Thin Films in O 2 /BCl 3 /Ar Inductively Coupled Plasma

Chang-I. Kim, D. Um, J. Woo, 2010 .

Dry Etching of High-k Dielectric Thin Films in HBr/Ar Plasma

Seung-Chan Moon, Gwan-Ha Kim, Sang-Wook Park, 2009 .

Microstructural Characteristics of Oxide Layer Growth on Tin Whisker and Finish Surface

J. Woo, Kyung-Seob Kim, 2019, Transactions on Electrical and Electronic Materials.

Low leakage current in metal-insulator-metal capacitors of structural Al2O3/TiO2/Al2O3 dielectrics

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

Ferroelectric Properties of Bi 3.25 La 0.75 Ti 3 O 12 Thin Films with Eu Contents for Non-volatile Memory Device Application

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2007 .

Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma

Chang-I. Kim, J. Park, J. Woo, 2011 .

The use of high density plasma system to improve the etch properties of the zinc tin oxide thin film for transparent thin film transistors active layers

Chang-I. Kim, J. Woo, Y. Chun, 2014 .

The dry etching property of TiO2 thin films using metal-insulator-metal capacitor in inductively coupled plasma system

J. Woo, Y. Joo, Y. Chun, 2012 .

Etch Characterization of TiO2 Thin Films Using Metal–Insulator–Metal Capacitor in Adaptively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2011 .

Dry etching properties of TiO2 thin films in O2/CF4/Ar plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Damage on the Surface of Zinc Oxide Thin Films Etched in Cl-based Gas Chemistry

Chang-I. Kim, J. Woo, Chen Li, 2011 .

Temperature Dependence on Dry Etching of Hafnium Oxide Using an Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2010 .

Characteristics of Nickel-doped Zinc Oxide thin films prepared by sol–gel method

Gwan-Ha Kim, Chang-I. Kim, J. Woo, 2008 .

A Study on the Surface of the Dry Etched TaN Thin Film by Adding The CH 4 Gas in BCl 3 /Ar Inductively Coupled Plasma

Woo-Seok Yang, Chang-I. Kim, J. Woo, 2013 .

The Study of the Etch Characteristics of the TaN Thin Film Using an Inductively Coupled Plasma

Chang-I. Kim, D. Um, J. Woo, 2009 .

Design of a fuzzy controller for the adaptive control of WEDM process

Yunn-Shiuan Liao, J. C Woo, J. Woo, 2000 .

Etching properties of Na0.5K0.5NbO3 thin films by using inductively coupled CF4/Ar plasma

Chang-I. Kim, J. Woo, Y. Joo, 2014 .

Surface Reaction of Na 0.5 K 0.5 NbO 3 Thin Films in Inductively Coupled BCl 3 /Cl 2 /Ar Plasma

Gwan-Ha Kim, Chang-I. Kim, D. Um, 2008 .

Etching Characteristics of HfAlO 3 Thin Films Using an Cl 2 /BCl 3 /Ar Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Tae-Kyung Ha, 2010 .

The Dry Etching Characteristics of TiO 2 Thin Films in N 2 /CF 4 /Ar Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2014 .

Effect of Dry Etching of TiO2 Thin Films Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

A Study on Etching Characteristics of SnO 2 Thin Films Using High Density Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Dry etching of CoFe films using a CH4∕Ar inductively coupled plasma for magnetic random access memory application

Chang-I. Kim, D. Um, J. Woo, 2009 .

The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions

D. Um, J. Woo, 2022, Micromachines.

Surface reaction effects on dry etching of IGZO thin films in N2/BCl3/Ar plasma

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

The Use of Inductively Coupled CF 4 /Ar Plasma to Improve the Etch Rate of ZrO 2 Thin Films

Chang-I. Kim, J. Woo, Y. Joo, 2013 .

Etching characteristics of TaN thin film using an inductively coupled plasma

Chang-I. Kim, D. Um, J. Woo, 2010 .

The Etching Characteristics of the TaN Thin Films Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Chen Li, 2013 .

Dry etching characteristics of HfAlO3 thin films in BCl3/Ar plasma using inductively coupled plasma system

Chang-I. Kim, J. Woo, Tae-Kyung Ha, 2011 .

Dry-etching properties of TiN for metal/high-k gate stack using BCl3-based inductively coupled plasma

Chang-I. Kim, D. Um, J. Woo, 2009 .

Etching characteristic of ZnO thin films in an inductively coupled plasma

Gwan-Ha Kim, Gwan-Ha Kim, J. Woo, 2008 .

Optical characterization of coherently strained short-period superlattice (InAs) n (AlAs) n grown by molecular beam epitaxy

D. W. Kim, Y. Leem, T. Hsu, 1992 .

Dry Etching of TaN Thin Films by Using an Inductively Coupled Plasma

Chang-I. Kim, D. Um, J. Woo, 2009 .

Sub-30 nm gate template fabrication for nanoimprint lithography using spacer patterning technology.

L. Do, K. No, J. Woo, 2011, Journal of nanoscience and nanotechnology.

The Dry Etching Properties of ZnO Thin Film in Cl 2 /BCl 3 /Ar Plasma

Chang-I. Kim, J. Woo, 2010 .

The Dry Etching Properties of TaN Thin Film Using Inductively Coupled Plasma

Chang-I. Kim, J. Woo, Y. Joo, 2012 .

Dry Etching Characteristics of ZrO2 Thin Films Using High Density Cl2/Ar Plasma

Xueyang, Chang-I. Kim, D. Um, 2010 .

Etch Characteristics of TiN Thin Film with Addition Cl 2 Gas in BCl 3 /Ar Plasma

Chang-I. Kim, D. Um, J. Woo, 2008 .