Li-Kang Wang

发表

DFT calculations of NH3 adsorption and dissociation on gallium-rich GaAs(001)-4×2 surface

David-Wei Zhang, S. Ding, Hongliang Lu, 2007 .

Investigation of atomic-layer-deposited ruthenium nanocrystal growth on SiO2 and Al2O3 films

David-Wei Zhang, S. Ding, Min Zhang, 2007 .

Atomic Layer Deposition of Hafnium Oxide from Tetrakis(ethylmethylamino)hafnium and Water Precursors

David-Wei Zhang, Qingqing Sun, S. Ding, 2007 .

First principles calculations of oxygen vacancy passivation by fluorine in hafnium oxide

David-Wei Zhang, Qingqing Sun, S. Ding, 2006 .

Mechanism of interfacial layer suppression after performing surface Al(CH3)3 pretreatment during atomic layer deposition of Al2O3

David-Wei Zhang, Qingqing Sun, S. Ding, 2006 .

Quantum chemical study of the initial surface reactions of HfO2 atomic layer deposition on the hydroxylated GaAs(001)-4×2 surface

David-Wei Zhang, S. Ding, Hongliang Lu, 2006 .

Initial surface reactions in atomic layer deposition of Al2O3 on the hydroxylated GaAs(001)-4 × 2 surface

David-Wei Zhang, S. Ding, Hongliang Lu, 2005 .

Effect of Pulse-Plated Nickel Barriers on Tin Whisker Growth for Pure Tin Solder Joints

David-Wei Zhang, Qingqing Sun, S. Ding, 2008 .

Characterization of atomic-layer-deposited Al2O3∕GaAs interface improved by NH3 plasma pretreatment

David-Wei Zhang, S. Ding, Hongliang Lu, 2006 .

Quantum chemical study of the initial surface reactions in atomic layer deposition of TiN on the SiO2 surface

David-Wei Zhang, S. Ding, Hongliang Lu, 2006, Journal of physics. Condensed matter : an Institute of Physics journal.

Spectroscopic and electrical properties of atomic layer deposition Al2O3 gate dielectric on surface pretreated Si substrate

David-Wei Zhang, S. Ding, Hongliang Lu, 2006 .

Effects of NH3 plasma pretreatment on initial reactions of atomic layer deposition TaN barrier layer on SiOC dielectric

David-Wei Zhang, S. Ding, Yuan Xue, 2007 .

Quantum Chemical Study of Adsorption and Dissociation of H2S on the Gallium-Rich GaAs (001)-4 × 2 Surface

David-Wei Zhang, S. Ding, Hongliang Lu, 2006 .

Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study

David-Wei Zhang, Qingqing Sun, S. Ding, 2007 .

Memory Effect of Metal-Insulator-Silicon Capacitor with HfO2-Al2O3 Multilayer and Hafnium Nitride Gate

David-Wei Zhang, S. Ding, Min Zhang, 2007 .

High-temperature conduction behaviors of HfO2/TaN-based metal-insulator-metal capacitors

Ran Liu, Shi-Jin Ding, David Wei Zhang, 2007 .