J. 0. Olowolafe

发表

Thermal and electrical properties of Au/B4C, Ni/B4C, and Ta/Si contacts to silicon carbide

W. Mitchel, J. 0. Olowolafe, J. Solomon, 2005 .

Interactions of Cu with CoSi2, CrSi2 and TiSi2 with and without TiNx barrier layers

J. 0. Olowolafe, J. Mayer, Jian Li, 1990 .

Al/TiW reaction kinetics: Influence of Cu and interface oxides

E. Colgan, J. 0. Olowolafe, J. Mayer, 1985 .

Effect of composition on thermal stability and electrical resistivity of Ta–Si–N films

T. Alford, I. Rău, J. 0. Olowolafe, 2000 .

The effect of Ta to Si ratio on magnetron sputtered Ta-Si-N thin films

T. Alford, I. Rău, J. 0. Olowolafe, 1999 .

Interdiffusions in Cu/reactive‐ion‐sputtered TiN, Cu/chemical‐vapor‐deposited TiN, Cu/TaN, and TaN/Cu/TaN thin‐film structures: Low temperature diffusion analyses

J. 0. Olowolafe, M. Kottke, R. Gregory, 1992 .

Interaction of cu with cosi2 with and without tinx barrier layers

B. Blanpain, J. 0. Olowolafe, J. Mayer, 1990 .

Structural, optical and electronic properties of oxidized AIN thin films at different temperatures

J. Suehle, M. Dashiell, J. Kolodzey, 1998 .

Shallow silicide contact

K. Tu, J. 0. Olowolafe, W. Hammer, 1980 .

Electrical and optical properties of phosphorus doped Ge1−yCy

Paul R. Berger, B. Orner, R. Wilson, 1998 .

Evaluation of Ta, Ti and TiW encapsulations for corrosion and diffusion protection of Cu interconnects

J. 0. Olowolafe, R. Gregory, C. Mogab, 1993 .

Effect of Si or Al interface layers on the properties of Ta and Mo contacts to p-type SiC

J. Liu, J. 0. Olowolafe, R. Gregory, 2000 .

Chromium thin film as a barrier to the interaction of Pd2Si with Al

M. Nicolet, J. 0. Olowolafe, J. Mayer, 1977 .

Intermetallic Compound Formation in Ti/Al Alloy Thin Film Couples and Its Role in Electromigration Lifetime

J. Stark, H. Kawasaki, D. Jawarani, 1994 .

Preparation and characterization of MOCVD thin films of indium tin oxide

M. Eleruja, E. Ajayi, J. 0. Olowolafe, 1999 .

Effect of interface layer on the microstructure and electromigration resistance of Al‐Si‐Cu alloy on TiN/Ti substrates

H. Kawasaki, D. Jawarani, J. 0. Olowolafe, 1993 .

Contact reaction between Si and Pd‐W alloy films

J. Angilello, K. Tu, J. 0. Olowolafe, 1979 .

Effect of Si3N4 encapsulation on the thermal processing of hydrogenated amorphous silicon

J. 0. Olowolafe, J. Olowolafe, 1988 .

Silicide formation by thermal annealing of Ni and Pd on hydrogenated amorphous silicon films

L. Hung, J. 0. Olowolafe, J. Mayer, 1985 .

Analyses of Pt/Ti Electrodes for Plzt Capacitors

Robert E. Jones, J. 0. Olowolafe, R. Hegde, 1991 .

Band gap of Ge rich Si1−x−yGexCy alloys

B. Orner, J. Kolodzey, J. 0. Olowolafe, 1996 .