D. Samélor

发表

Surface-driven, one-step chemical vapor deposition of γ-Al4Cu9 complex metallic alloy film

F. Senocq, T. Duguet, N. Prud’homme, 2013 .

Al-Cu intermetallic coatings processed by sequential metalorganic chemical vapour deposition and postdeposition annealing

D. Mangelinck, F. Senocq, T. Duguet, 2012 .

Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenches

P. Brault, A. Boudouvis, A. Thomann, 2013 .

Protective Alumina Coatings by Low Temperature Metalorganic Chemical Vapour Deposition

S. Perişanu, A. Gleizes, C. Vahlas, 2007 .

Tunable SiO2 to SiOxCyH films by ozone assisted chemical vapor deposition from tetraethylorthosilicate and hexamethyldisilazane mixtures

F. Senocq, C. Genevois, C. Vahlas, 2020 .

Investigation of the densification mechanisms and corrosion resistance of amorphous silica films

V. Rouessac, C. Vahlas, D. Samélor, 2019, Journal of Non-Crystalline Solids.

Corrosion protection of 304L stainless steel by chemical vapor deposited alumina coatings

Nadine Pébère, C. Vahlas, D. Samélor, 2014 .

Network hydration, ordering and composition interplay of chemical vapor deposited amorphous silica films from tetraethyl orthosilicate

F. Senocq, M. Allix, C. Genevois, 2021, Journal of Materials Research and Technology.

Monitoring microstructure and phase transitions in thin films by high‐temperature resistivity measurements

D. Mangelinck, F. Senocq, T. Duguet, 2012 .

Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films

F. Senocq, C. Genevois, C. Vahlas, 2021 .

Modeling a MOCVD process to apply alumina films on the inner surface of bottles

C. Vahlas, D. Samélor, B. Caussat, 2015 .

Engineering structure and functionalities of chemical vapor deposited photocatalytic titanium dioxide films through different types of precursors

J. Cure, C. Vahlas, D. Samélor, 2021, CrystEngComm.

Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: interplay between film characteristics and corrosion protection of stainless steel

J. Etzkorn, A. Kostka, A. Devi, 2021, Journal of Materials Research and Technology.

A Process-Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI) †

L. Baggetto, A. Gleizes, C. Vahlas, 2015 .

Amorphous Alumina Barrier Coatings on Glass: MOCVD Process and Hydrothermal Aging

L. Baggetto, C. Vahlas, D. Samélor, 2016 .

Efficient, durable protection of the Ti6242S titanium alloy against high-temperature oxidation through MOCVD processed amorphous alumina coatings

L. Baggetto, T. Duguet, A. Gleizes, 2019, Journal of Materials Science.

Amorphous Alumina Films Efficiently Protect Ti6242S against Oxidation and Allow Operation above 600 °C

L. Baggetto, T. Duguet, C. Vahlas, 2018, Materials Science Forum.

Temperature Dependent 4-, 5- and 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: From Local Coordination to Material Properties

D. Massiot, A. Gleizes, C. Vahlas, 2014 .

Residual Stress Mechanisms in Aluminium Oxide Films Grown by MOCVD

B. Sheldon, S. Soni, A. Gleizes, 2009 .

Conformity of Aluminum Thin Films Deposited onto Micro‐Patterned Silicon Wafers by Pulsed Laser Deposition, Magnetron Sputtering, and CVD

R. Blanc, A. Thomann, Lyacine Aloui, 2011 .

Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance

F. Senocq, Y. Tison, C. Genevois, 2022, ACS Applied Electronic Materials.

An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine

F. Senocq, C. Vahlas, D. Samélor, 2021, Chemical Engineering Journal.

An innovative GC-MS, NMR and ESR combined, gas-phase investigation during chemical vapor deposition of silicon oxynitrides films from tris(dimethylsilyl)amine.

F. Senocq, C. Vahlas, D. Samélor, 2021, Physical chemistry chemical physics : PCCP.

Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology

V. Constantoudis, F. Senocq, N. Prud’homme, 2020, Thin Solid Films.

Thermal behaviour of CpCuPEt3 in gas phase and Cu thin films processing

F. Senocq, A. Gleizes, N. Prud’homme, 2007 .

Temperature-Dependent 4-, 5- and 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: A Very High Field 27Al-NMR study

D. Massiot, A. Gleizes, C. Vahlas, 2013 .

Mechanical and barrier properties of MOCVD processed alumina coatings on Ti6Al4V titanium alloy

C. Vahlas, D. Samélor, Y. Balcaen, 2011 .

Barrier properties and hydrothermal aging of amorphous alumina coatings applied on pharmaceutical vials

C. Vahlas, D. Samélor, B. Caussat, 2021, Surface and Coatings Technology.

Nanocomposite thin film of Ag nanoparticles embedded in amorphous Al 2 O 3 on optical sensors windows: Synthesis, characterization and targeted application towards transparency and anti-biofouling

G. Papavieros, V. Constantoudis, C. Vahlas, 2017 .

Evaluation of Al2O3 MOCVD Coating for Titanium Alloys Protection under Severe Conditions at High Temperature

B. Sheldon, A. Gleizes, C. Vahlas, 2008 .

Aluminium tri-iso-propoxide: Shelf life, transport properties, and decomposition kinetics for the low temperature processing of aluminium oxide-based coatings

A. Gleizes, C. Vahlas, D. Samélor, 2007 .

Phase Transformations of Metallorganic Chemical Vapor Deposition Processed Alumina Coatings Investigated by In Situ Deflection

A. Gleizes, C. Vahlas, D. Samélor, 2007 .

CVD‐Fabricated Aluminum Oxide Coatings from Aluminum tri‐iso‐propoxide: Correlation Between Processing Conditions and Composition

M. Lafont, A. Gleizes, C. Vahlas, 2007 .

Low Temperature MOCVD-Processed Alumina Coatings

A. Gleizes, C. Vahlas, D. Samélor, 2006 .

Large temperature range model for the atmospheric pressure chemical vapor deposition of silicon dioxide films on thermosensitive substrates

F. Senocq, C. Vahlas, D. Samélor, 2020, Chemical Engineering Research and Design.

Development of a kinetic model for the moderate temperature chemical vapor deposition of SiO2 films from tetraethyl orthosilicate and oxygen

C. Vahlas, D. Samélor, B. Caussat, 2018, AIChE Journal.

CVD of Pure Copper Films from a Novel Amidinate Precursor

F. Senocq, N. Prud’homme, Lyacine Aloui, 2009 .

In-situ infrared thermography measurements to master transmission laser welding process parameters of PEKK

M. A. Madre, C. Garnier, D. Samélor, 2018, Optics and Lasers in Engineering.

Multilayer chromium based coatings grown by atmospheric pressure direct liquid injection CVD

F. Maury, A. Douard, D. Samélor, 2009 .

Electrochemical Behavior of Chemical Vapor Deposited Protective Aluminum Oxide Coatings on Ti6242 Titanium Alloy

A. Gleizes, C. Vahlas, D. Samélor, 2008 .

Chemical Vapor Deposition of Iron, Iron Carbides, and Iron Nitride Films from Amidinate Precursors

F. Senocq, A. Gleizes, N. Prud’homme, 2010 .

Black Co oxides coatings for thermosensitive polymer surfaces by low-temperature DLI-MOCVD

T. Duguet, C. Vahlas, D. Samélor, 2018, Surface and Coatings Technology.

Chemical vapor deposition of low reflective cobalt (II) oxide films

T. Duguet, C. Vahlas, D. Samélor, 2016 .

Photo-electrocatalytic performance of poly(3,4-ethylenedioxythiophene)/TiO2 nano-tree films deposited by oCVD/CVD for H2 production

A. Nada, S. Roualdès, S. Tingry, 2023, Applied Surface Science.

Amorphous alumina coatings: processing, structure and remarkable barrier properties.

D. Poquillon, A. Gleizes, C. Vahlas, 2011, Journal of nanoscience and nanotechnology.

Amorphous Alumina Coatings on Glass Bottles Using Direct Liquid Injection MOCVD for Packaging Applications

C. Vahlas, D. Samélor, B. Caussat, 2014 .

Corrosion barrier alumina/zirconia bilayer stack on low Cr steel by direct liquid injection metalorganic chemical vapor deposition

J. Etzkorn, Alexandre Jaud, C. Vahlas, 2023, Surface and Coatings Technology.