Byungwhan Kim

Byungwhan Kim, Byungwhan Kim, Wookyung Choi, 2001, ISIE 2001. 2001 IEEE International Symposium on Industrial Electronics Proceedings (Cat. No.01TH8570).

Monitoring plasma impedance match characteristics in a multipole inductively coupled plasma for process control

Byungwhan Kim, Byungwhan Kim, Chang-Keun Lee, 2000 .

In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart

Byungwhan Kim, S. Baik, W. Kim, 2009 .

Wavelet monitoring of plasma etching

Byungwhan Kim, W. S. Choi, M. Lim, 2003 .

Discrete wavelet monitoring of plasma impedance matching for process control

Byungwhan Kim, Wookyung Choi, 2001, ISIE 2001. 2001 IEEE International Symposium on Industrial Electronics Proceedings (Cat. No.01TH8570).

Radio-frequency transient match monitoring using a fast Fourier transform for plasma diagnosis

Byungwhan Kim, 2001 .

In-Situ Leak Detection of Plasma Processing Chamber Using Neural Network and Optical Emission Spectroscopy

G. May, Byungwhan Kim, S. Baik, 2011 .

Ex-situ plasma diagnosis by combining scanning electron microscope, wavelet, and neural network

Byungwhan Kim, H. Uh, Donghwan Kim, 2008 .

Impact of bias power-induced ion energy on refractive index of SiN films room-temperature deposited in SiH4–NH3–N2 pulsed plasma

Byungwhan Kim, Sanghee Kwon, Hwajune Lee, 2010 .

Neural network characterization of plasma-induced charging damage on thick oxide-based metal-oxide-semiconductor device

K. Kwon, K. Baek, Byungwhan Kim, 2009 .

Modeling of silicon oxynitride etch microtrenching using genetic algorithm and neural network

Byungwhan Kim, Byung-Teak Lee, Byung-Teak Lee, 2006 .

Neural Network Model of Plasma Charging Damage on MOSFET Device

Byungwhan Kim, Donghwan Kim, Hwajune Lee, 2009 .

Temperature effect on charge density of silicon nitride films deposited in SiH4–NH3–N2 plasma

Byungwhan Kim, Sanghee Kwon, 2008 .

Use of Speckle Pattern for Monitoring Thermal Energy Behavior of Battery Cathode

Byungwhan Kim, J. Jang, 2016 .

Measurement of surface roughness of plasma-deposited films using laser speckles

Byungwhan Kim, Junhyun Seo, 2015 .

Structural analysis of nano structured carbon by transmission electron microscopy and image processing

Y. Kim, Bo-Hye Kim, M. Endo, 2013 .

Enhanced field emission properties from titanium-coated carbon nanotubes

Sangsik Park, Byungwhan Kim, H. Uh, 2010 .

Modelling of plasma etching using a generalized regression neural network

Kunho Kim, Byungwhan Kim, Byungwhan Kim, 2003 .

Use of Neural Network and Genetic Algorithm to Model Scanning Electron Microscopy for Enhanced Image of Material Surfaces

Sung Wook Baik, Byungwhan Kim, Dong Hwan Kim, 2011 .

Prediction of plasma etching using a randomized generalized regression neural network

Seongjin Choi, Byungwhan Kim, Byungwhan Kim, 2004 .

Refraction properties of PECVD of silicon nitride film

Byungwhan Kim, Dong Won Kim, Seung-Soo Han, 2004 .

Modeling refraction characteristics of silicon nitride film deposited in a SiH/sub 4/-NH/sub 3/-N/sub 2/ plasma using neural network

Seung-Soo Han, Byungwhan Kim, Tae Seon Kim, 2003 .

LATEST ON LIGHT MATTER

Byungwhan Kim, 2014 .

In-Line Hologram for Plasma Diagnostics

Byungwhan Kim, Jin-Su Jung, 2016 .

Adaptive Network-Based Fuzzy Inference Model of Plasma Enhanced Chemical Vapor Deposition Process

Seongjin Choi, Byungwhan Kim, Seongjin Choi, 2007, ISNN.

Conversion acceptor and its contribution to hole scattering in annealed GaAs

Y. Shin, Y. Jung, Byungho Lee, 1989 .

Prediction of plasma-induced DC bias using polynomial neural network

Byungwhan Kim, Dongwon Kim, G. Park, 2005 .

Prediction of etch microtrenching using a neural network

Byungwhan Kim, K. Kwon, Byungwhan Kim, 2004 .

Modeling of a hemispherical inductively coupled plasma using neural network

Byungwhan Kim, Suyeon Kim, 2009 .

Wavelet characterization of plasma etch nonuniformity

Byungwhan Kim, Kyeong K. Lee, W. Hong, 2004 .

Relationships between etch rate and roughness of plasma etched surface

Byung-Teak Lee, Byungwhan Kim, 2002 .

Plasma control using neural network and optical emission spectroscopy

Byungwhan Kim, Byungwhan Kim, Jung Ki Bae, 2005 .

Modelling plasma etching of AI thin films using neural network

Byungwhan Kim, K. Park, D. Han, 2004 .

GA-optimized backpropagation neural network with multi-parameterized gradients and applications to predicting plasma etch data

Byungwhan Kim, Byungwhan Kim, Sungmo Kim, 2005 .

Surface roughness of silicon carbide etching in a NF3 inductively coupled plasma

Byung-Teak Lee, Byungwhan Kim, Kyeongseok Lee, 2005 .

Low pressure plasma etching of silicon carbide

Byung-Teak Lee, Byungwhan Kim, Sungmo Kim, 2005 .

Use of a neural network to model SiC etching in a NF3 inductively coupled plasma

Seongjin Choi, Byungwhan Kim, Byung Teak Lee, 2005 .

Etching of 4H-SiC using a NF3 inductively coupled plasma

Byung-Teak Lee, Byungwhan Kim, 2004 .

Prediction of SiC etching in a NF3∕CH4 plasma using neural network

Byung-Teak Lee, Byungwhan Kim, 2004 .

Etching of 4H–SiC in a NF3/CH4 inductively coupled plasma

Byung-Teak Lee, Byungwhan Kim, Suk Yong Lee, 2003 .

Oxide via etching in a magnetically enhanced CHF3/CF4/Ar plasma

Sung-Ku Kwon, Byungwhan Kim, 2003 .

Radio frequency bias power effect on surface roughness of silicon carbide plasma etching

Byung-Teak Lee, Byungwhan Kim, Kunho Kim, 2003 .

Surface roughness of silicon carbide etched in a C2F6/O2 inductively coupled plasma

Byung-Teak Lee, Byungwhan Kim, H. Choi, 2002 .

Analysis of ion energy impact on the refractive index of silicon nitride films by use of neural network model

Byungwhan Kim, Daehyun Kim, 2012 .

Duty ratio-controlled surface oughness of silicon nitride film deposited using room-temperature SiH4−NH3−N2 Plasma

Y. Seo, Byungwhan Kim, Daehyun Kim, 2010 .

Impact of radio frequency source power-induced ion energy on a refractive index of SiN film deposited by a pulsed-PECVD at room temperature

Byungwhan Kim, Suyeon Kim, 2010 .

Deposition rate of SiN film grown by using a pulsed-PECVD at room-temperature

Byungwhan Kim, Suyeon Kim, 2010 .

Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition

Byungwhan Kim, Suyean Kim, 2009 .

Etching of oxynitride thin films using inductively coupled plasma

Byung-Teak Lee, Byungwhan Kim, Dukwoo Lee, 2005 .

Visible electron orbits of carbon atom

Byungwhan Kim, 2012, Electronic Materials Letters.

Diagnosis of Plasma Equipment using Neural Network and Impedance Match Monitoring

Byungwhan Kim, Byungwhan Kim, 2002 .

Optimization of Principal-Component-Analysis-Applied in Situ Spectroscopy Data Using Neural Networks and Genetic Algorithms

Byungwhan Kim, Byungwhan Kim, Min Ji Kwon, 2008, Applied spectroscopy.

Qualitative modeling of silica plasma etching using neural network

Byungwhan Kim, K. Kwon, Byungwhan Kim, 2003 .

Modeling electron cyclotron resonance etching of Ba(Mg1/3Ta2/3)O3 films using neural networks

Seung-Youl Kang, K. Kwon, Byungwhan Kim, 2002 .

WRONG MODEL OF PHOTON

Byungwhan Kim, 2018 .

Functional Kernel-Based Modeling of Wavelet Compressed Optical Emission Spectral Data: Prediction of Plasma Etch Process

Young-Don Ko, Byungwhan Kim, Myong-Kee Jeong, 2010, IEEE Sensors Journal.

Plasma sensor for monitoring laser-interacting particles in contact with an electrode

Byungwhan Kim, Dongil Han, Dongwha Jung, 2014, Electronic Materials Letters.

Partial X-ray photoelectron spectroscopy to constructing neural network model of plasma etching surface

Woo Suk Kim, Byungwhan Kim, Byungwhan Kim, 2007 .

Prediction of Radio Frequency Impedance Matching in Plasma Equipment Using Neural Network

Donghwan Kim, Seung Soo Han, Byungwhan Kim, 2006, ISNN.

Temperature effect on deposition rate of silicon nitride films

Byungwhan Kim, J. Park, Byungwhan Kim, 2006 .

Prediction of silicon oxynitride plasma etching using a generalized regression neural network

Byungwhan Kim, Byung-Teak Lee, Byung-Teak Lee, 2005 .

Radio Frequency Power Effect on Charge Density of PECVD-SiN Thin Films

Byungwhan Kim, Jeong Kim, H. Uh, 2007 .

Prediction of profile surface roughness in CHF3/CF4 plasma using neural network

Byungwhan Kim, Byungwhan Kim, Kunho Kim, 2004 .

Exponentially weighted moving average-based procedure with adaptive thresholding for monitoring nonlinear profiles: Monitoring of plasma etch process in semiconductor manufacturing

Young-Don Ko, Young-Seon Jeong, Byungwhan Kim, 2013, Expert Syst. Appl..

Modeling oxide etching in a magnetically enhanced reactive ion plasma using neural networks

Kwang-Ho Kwon, Byungwhan Kim, Bo-Woo Kim, 2002 .

Prediction of plasma processes using neural network and genetic algorithm

Byungwhan Kim, Jungki Bae, Byungwhan Kim, 2005 .

Oxide via hole formation using magnetically enhanced reactive ion etching

Byungwhan Kim, J. Y. Park, 2005 .

Modeling plasma etching process using a radial basis function network

Byungwhan Kim, Byungwhan Kim, K. Park, 2005 .

Modeling SiC surface roughness using neural network and atomic force microscopy

Byung-Teak Lee, Byungwhan Kim, Sungmo Kim, 2004 .

An optimal neural network process model for plasma etching

Gary S. May, Byungwhan Kim, G. May, 1994 .

Design and VLSI implementation of a high-performance face detection engine

Dongil Han, Jae Il Cho, Jongho Choi, 2012, Comput. Electr. Eng..

Neural network characterization of scanning electron microscopy

Byungwhan Kim, Donghwan Kim, Sanghee Kwon, 2008, ICONS 2008.

Optimization of optical lens-controlled scanning electron microscopic resolution using generalized regression neural network and genetic algorithm

Sanghee Kwon, Donghwan Kim, Byungwhan Kim, 2010, Expert Syst. Appl..

Plasma etching of silicon oxynitride in a low-pressure C2F6 plasma

Byungwhan Kim, Byung-Teak Lee, J. Park, 2005 .

Modeling of ion energy distribution using time-series neural network

Byungwhan Kim, Byungwhan Kim, Suyeon Kim, 2008, International Conference on Systems.

Backpropergation Classification of Statistiscally Designed Experiment

Sungmo Kim, Byungwhan Kim, Byungwhan Kim, 2002 .