L. L. Yusup

Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor.

Jae-Min Park, S. Jang, L. L. Yusup, 2016, ACS applied materials & interfaces.

Reactivity of different nitriding agents with chlorine-terminated surface during atomic layer deposition of silicon nitride

L. L. Yusup, Won-Jun Lee, Young-Kyun Kwon, 2021 .

Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride

Jae-Min Park, L. L. Yusup, Won-Jun Lee, 2018 .

Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine.

Jae-Min Park, L. L. Yusup, Won-Jun Lee, 2018, Langmuir : the ACS journal of surfaces and colloids.

Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation

M. Pons, Jongwan Jung, Jae-Min Park, 2017 .

Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

Sun-Jae Kim, Sora Park, Jae-Min Park, 2016 .