Won-Jun Lee

发表

Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor.

Jae-Min Park, S. Jang, L. L. Yusup, 2016, ACS applied materials & interfaces.

Ultrathin SiGe Shell Channel p-Type FinFET on Bulk Si for Sub-10-nm Technology Nodes

Seongjae Cho, Won-Jun Lee, Eunseon Yu, 2018, IEEE Transactions on Electron Devices.

Atomic layer deposition of cobalt oxide thin films using cyclopentadienylcobalt dicarbonyl and ozone at low temperatures

Jongwan Jung, Jae-Min Park, Won-Jun Lee, 2013 .

Mechanism of surface modification of a porous-coated Ti-6Al-4V implant fabricated by electrical resistance sintering

Dong Kwan Kim, Jung-Yuel Kim, Jae-Rock Lee, 2001 .

Reactivity of different nitriding agents with chlorine-terminated surface during atomic layer deposition of silicon nitride

L. L. Yusup, Won-Jun Lee, Young-Kyun Kwon, 2021 .

Si‐core/SiGe‐shell channel nanowire FET for sub‐10‐nm logic technology in the THz regime

Seongjae Cho, Jongwan Jung, Won-Jun Lee, 2019, ETRI Journal.

X-ray photoelectron spectroscopic studies of surface modified single-walled carbon nanotube material

P. J. Reucroft, R. Haddon, Jaegab Lee, 2001 .

Atomic layer deposition of tungsten and tungsten-based compounds using WCl5 and various reactants selected by density functional theory

Soo‐Hyun Kim, Won-Jun Lee, Yewon Kim, 2021 .

Preparation of tungsten-based thin films using a F-free W precursor and tert-butyl hydrazine via 2- and 3-step atomic layer deposition process

Soo‐Hyun Kim, Won-Jun Lee, D. Nandi, 2021, Applied Surface Science.

Graphene synthesis on Fe foil using thermal CVD

Jongwan Jung, Won-Jun Lee, H. An, 2011 .

Low-Temperature Atomic Layer Deposition of Cobalt Oxide Thin Films Using Dicobalt Hexacarbonyl tert-Butylacetylene and Ozone

Won-Jun Lee, W. Han, K. Park, 2011 .

Formation of Nano-oxides on Porous Metallic Glass Compacts using Hydrothermal Synthesis

Yura Kim, W. Lee, Ji-tae Kim, 2015 .

Atomic layer deposition of stoichiometric Co3O4 films using bis(1,4-di-iso-propyl-1,4-diazabutadiene) cobalt

Jae-Min Park, Won-Jun Lee, T. R. Mayangsari, 2015 .

Surface Reaction Mechanism of Atomic Layer Deposition of Niobium Oxide: In Situ Characterization and First-Principle Study

Won-Jun Lee, Hyeonsu Roh, J. Seok, 2023, SSRN Electronic Journal.

Plasma-enhanced atomic layer deposition of nickel thin film using bis(1,4-diisopropyl-1,4-diazabutadiene)nickel

Jae-Min Park, Won-Jun Lee, W. Han, 2018 .

Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules

Seongjae Cho, Jongwan Jung, Won-Jun Lee, 2021, Applied Surface Science.

Atomic layer deposition and tellurization of Ge–Sb film for phase-change memory applications

Jae-Min Park, Won-Jun Lee, Yewon Kim, 2019, RSC advances.

Estimation of phase ratio for nano-sized TiO2 powders by Ti K-edge XANES

Sun-Jae Kim, Won-Jun Lee, H. Lim, 2003 .

Selective growth of graphene in layer-by-layer via chemical vapor deposition.

Jaehyun Park, Wan-Gyu Lee, N. Lee, 2016, Nanoscale.

Graphene film growth on sputtered thin Cu–Ni alloy film by inductively coupled plasma chemical vapor deposition

Jaehyun Park, Wan-Gyu Lee, K. An, 2014 .

Density functional theory study on the reducing agents for atomic layer deposition of tungsten using tungsten chloride precursor

Soo‐Hyun Kim, Won-Jun Lee, Yewon Kim, 2021 .

Gas-phase etching mechanism of silicon oxide by a mixture of hydrogen fluoride and ammonium fluoride: A density functional theory study

Seongjae Cho, Jongwan Jung, Won-Jun Lee, 2023, Journal of Vacuum Science & Technology A.

Self-assembled bulk metallic glass composite prepared by electro discharge bonding technique

N. Lee, Junsoo Park, Won-Jun Lee, 2007 .

RF transmission properties of graphene monolayers with width variation

Hee-Jo Lee, Eunho Kim, Jongwan Jung, 2012 .

Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride

Jae-Min Park, L. L. Yusup, Won-Jun Lee, 2018 .

Density functional theory study on the fluorination reactions of silicon and silicon dioxide surfaces using different fluorine-containing molecules

Jongwan Jung, Won-Jun Lee, T. R. Mayangsari, 2019, Journal of Vacuum Science & Technology A.

Corrigendum to “Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules” [Appl. Surf. Sci. 554 (2021) 149481]

Seongjae Cho, Jongwan Jung, Won-Jun Lee, 2022, Applied Surface Science.

Erratum: “Density functional theory study on the fluorination reactions of silicon and silicon dioxide surfaces using different fluorine-containing molecules” [J. Vac. Sci. Technol. A 37, 021001 (2019)]

Jongwan Jung, Won-Jun Lee, T. R. Mayangsari, 2022, Journal of Vacuum Science & Technology A.

Effect of deposition temperature and surface reactions in atomic layer deposition of silicon oxide using Bis(diethylamino)silane and ozone

Won-Jun Lee, D. Shin, H. Son, 2022, Applied Surface Science.

Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine.

Jae-Min Park, L. L. Yusup, Won-Jun Lee, 2018, Langmuir : the ACS journal of surfaces and colloids.

Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study

Won-Jun Lee, Y. Byun, Hohoon Kim, 2021 .

Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation

M. Pons, Jongwan Jung, Jae-Min Park, 2017 .

Process Steps for High Quality Si-Based Epitaxial Growth at Low Temperature via RPCVD

Seongjae Cho, Jongwan Jung, Won-Jun Lee, 2021, Materials.

Effects of hydrogen in the cooling step of chemical vapor deposition of graphene

Eunho Kim, Jongwan Jung, Won-Jun Lee, 2013, Electronic Materials Letters.

Atomic layer deposition of copper nitride film and its application to copper seed layer for electrodeposition

M. Kim, Jongwan Jung, Jae-Min Park, 2014 .

Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

Sun-Jae Kim, Sora Park, Jae-Min Park, 2016 .

Atomic layer deposition of copper thin film using CuII(diketoiminate)2 and H2

Won-Jun Lee, J. Park, K. Park, 2009, 2009 IEEE International Interconnect Technology Conference.

Influence of the deposition temperature on the properties of copper thin films prepared by alternating injection of Cu(ethylketoiminate)2 and H2 on a ruthenium substrate

Won-Jun Lee, Jinsik Kim, K. Park, 2012 .

Low damage-transfer of graphene using epoxy bonding

Mina Kim, Jongwan Jung, Won-Jun Lee, 2013, Electronic Materials Letters.