D. Blin

Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon

M. Kaiser, J. Klootwijk, F. Roozeboom, 2008, IEEE Electron Device Letters.

Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si

Olivier Renault, D. Blin, Anne-Marie Papon, 2003 .

HfO2/SiO2 interface chemistry studied by synchrotron radiation x-ray photoelectron spectroscopy

Olivier Renault, P. Besson, François Martin, 2002 .

Crystallisation kinetics and density profiles in ultra-thin hafnia films

P. Holliger, J. Durand, D. Blin, 2004 .

ALD Options for Si-integrated Ultrahigh-density Decoupling Capacitors in Pore and Trench Designs

Wouter Dekkers, Stephan Heil, J. Klootwijk, 2007, ECS Transactions.