Young-Wug Kim

发表

Integration of MIM capacitors with low-k/Cu process for 90 nm analog circuit applications

Jeong-Hoon Ahm, Kyung-Tae Lee, Mu-Kyeung Jung, 2003, Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695).

Nitrogen profile effects on the growth rate of gate oxides grown on nitrogen-implanted silicon

Sung I. Hong, Seung-Woo Lee, Byung-Gook Park, 2001 .

Ultrathin gate oxide grown on nitrogen-implanted silicon for deep submicron CMOS transistors

Sung I. Hong, Seung-Woo Lee, Byung-Gook Park, 2001 .

Negative bias temperature instability in triple gate transistors

You-Seung Jin, Jung-A Choi, Kwang-Pyuk Suh, 2004, 2004 IEEE International Reliability Physics Symposium. Proceedings.

An alternative interpretation of hot electron interface degradation in NMOSFETs: isotope results irreconcilable with major defect generation by holes?

K. Hess, J. Lyding, Young-Wug Kim, 1999 .

Effect of low temperature deuterium annealing on plasma process induced damage

B. Kang, K. Hess, J. Lyding, 1999, 1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395).

The effect of body contact arrangement on thin SOI MOSFET characteristics

Young-Wug Kim, C. Oh, Jong-Hyon Ahn, 1995 .

Device characteristics and reliability for 0.18 /spl mu/m MOSFET with 20 /spl Aring/ gate oxide formed by RTO

Young-Wug Kim, K. Suh, Jeong-Hwan Yang, 1999, ICVC '99. 6th International Conference on VLSI and CAD (Cat. No.99EX361).

Series resistance at metal contact for thin film SOI MOSFET

Dong-Hyun Kim, Young-Wug Kim, C. Oh, 1994, Proceedings. IEEE International SOI Conference.

Deuterium pressure dependence of characteristics and hot-carrier reliability of CMOS devices

S. A. Shah, K. Hess, J. Lyding, 2001 .

Thermal stability of atomic-layer-deposited HfO2 thin films on the SiNx-passivated Si substrate

C. Hwang, Jaehoon Park, Hong-bae Park, 2002 .

Improved hot-carrier reliability of SOI transistors by deuterium passivation of defects at oxide/silicon interfaces

J. Lyding, Young-Wug Kim, K. Suh, 2002 .

Impact of mechanical stress engineering on flicker noise characteristics

S. Maeda, You-Seung Jin, Jung-A Choi, 2004, Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..

Improved current performance of CMOSFETs with nitrogen incorporated HfO2-Al2O3 laminate gate dielectric

Ho-Kyu Kang, N. Lee, H. Chang, 2002, Digest. International Electron Devices Meeting,.

Three dimensional analysis of thermal degradation effects in FDSOI MOSFETs

Young-Wug Kim, Young-Kwan Park, Jeong-Taek Kong, 2000, Proceedings IEEE 2000 First International Symposium on Quality Electronic Design (Cat. No. PR00525).

Microstructures of Tungsten Suicide Films Deposited by CVD and by Sputtering

N. Lee, Young-Wug Kim, M. Park, 1994 .