Seok-jun Won

发表

High quality high-k MIM capacitor by Ta/sub 2/O/sub 5//HfO/sub 2//Ta/sub 2/O/sub 5/ multi-layered dielectric and NH/sub 3/ plasma interface treatments for mixed-signal/RF applications

Ho-Kyu Kang, K. Suh, Y. Jeong, 2004, Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..

Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants

C. Hwang, S. Kim, G. Choi, 2009 .

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

H. Kim, Seok-jun Won, M. Huh, 2010, IEEE Electron Device Letters.

The Role of the Methyl and Hydroxyl Groups of Low-k Dielectric Films on the Nucleation of Ruthenium by ALD

C. Hwang, Sang Young Lee, Jaeyeong Heo, 2008 .

Investigation on spatially separated atomic layer deposition by gas flow simulation and depositing Al2O3 films

C. Hwang, H. Kim, Seok-jun Won, 2012 .

Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas

C. Hwang, G. Choi, Sang Woon Lee, 2010 .

Effect of catalyst layer density and growth temperature in rapid atomic layer deposition of silica using tris(tert-pentoxy)silanol.

C. Hwang, N. Lee, H. Kim, 2011, ACS applied materials & interfaces.

Zirconium-assisted reaction in low temperature atomic layer deposition using Bis(ethyl-methyl-amino)silane and water

H. Kim, Seok-jun Won, Y. Choi, 2011 .

Improving the Morphological and Optical Properties of Sputtered Indium Tin Oxide Thin Films by Adopting Ultralow-Pressure Sputtering

Jae Kyeong Jeong, C. Hwang, Jaeyeong Heo, 2009 .

Electrical and Bias Temperature Instability Characteristics of n-Type Field-Effect Transistors Using HfO x N y Gate Dielectrics

Jeong Hwan Kim, C. Hwang, N. Lee, 2010 .

The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films

C. Hwang, G. Choi, Ju-youn Kim, 2009 .

Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

Jaeyeong Heo, H. Kim, Seok-jun Won, 2013 .

Turn-Around Effect of $V_{\rm th}$ Shift During the Positive Bias Temperature Instability of the n-Type Transistor With $\hbox{HfO}_{x}\hbox{N}_{y}$ Gate Dielectrics

Jeong Hwan Kim, C. Hwang, N. Lee, 2010, IEEE Electron Device Letters.

Atomic Layer Deposition of Ruthenium Nanoparticles Using a Low-Density Dielectric Film as Template Structure

C. Hwang, Sang Young Lee, Jaeyeong Heo, 2009 .

The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrO x N y Gate Dielectrics

Jeong Hwan Kim, Sang Young Lee, Cheol Seong Hwang, 2010 .

Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

C. Hwang, N. Lee, H. Kim, 2012 .

Improvement in the performance of ZnO thin film transistors by using ultralow-pressure sputtering

Jae Kyeong Jeong, H. Kim, Seok-jun Won, 2011 .