Richard Good

Lithography process control using scatterometry metrology and semi-physical modeling

Alok Vaid, Oleg Kritsun, Kevin R. Lensing, 2007, SPIE Advanced Lithography.

Semiconductor manufacturing process control and monitoring: A fab-wide framework

S. Joe Qin, Jin Wang, Richard Good, 2006 .

Session-based end-to-end policy control in 3GPP evolved packet system

Thomas Magedanz, Neco Ventura, Richard Good, 2010 .