T. Delande

Wafer Level Characterization of the Sacrificial HDP Oxide Lateral Etching by Anhydrous Vapor HF with Ethanol Vapor for SiGe MEMS Structures

S. Severi, A. Witvrouw, H. Cui, 2010 .

Saturation effects in TXRF on micro-droplet residue samples

S. Gendt, C. Vinckier, W. Fyen, 2004 .

Partial Wetting of Aqueous Solutions on High Aspect Ratio Nanopillars with Hydrophilic Surface Finish

Xiumei Xu, K. Nafus, H. Struyf, 2014 .

Wetting Challenges in Cleaning of High Aspect Ratio Nano-Structures

H. Struyf, G. Vereecke, S. Armini, 2012 .

Remediation for TXRF saturation effects on microdroplet residues from preconcentration methods on semiconductor wafers

T. Conard, S. Gendt, C. Vinckier, 2005 .