S. Yoon

Stress management in sub-90-nm transistor architecture

R. Arghavani, M. Seamons, A. Mascarenhas, 2004, IEEE Transactions on Electron Devices.

Study of thin gate oxides grown in an ultra-dry/clean triple-wall oxidation furnace system

M. White, S. Yoon, 1990 .

Scaling effect on electromigration reliability for Cu/low-k interconnects

P. Ho, S. Yoon, J. Pyun, 2005, 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual..

A New Method of Interface Trap Modeling in Quantized MOSFET Inversion Layers

M. White, R. Siergiej, S. Yoon, 1991, [1991] 49th Annual Device Research Conference Digest.

Numerical Simulations of Stress Relaxation by Interface Diffusion in Patterned Copper Lines

P. Ho, A. Bower, S. Shankar, 2004 .

Dielectric and Scaling Effects on Electromigration for Cu Interconnects

P. Ho, S. Yoon, J. Pyun, 2005 .

Reliability challenges and recent advances for Cu interconnects

Ki-Don Lee, P. Ho, Ki-Don Lee, 2004, 5th International Conference on Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, 2004. EuroSimE 2004. Proceedings of the.

Electromigration threshold for Cu/low k interconnects

Ki-Don Lee, P. Ho, Ki-Don Lee, 2003, Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695).

Numerical simulations and experimental measurements of stress relaxation by interface diffusion in a patterned copper interconnect structure

P. Ho, A. Bower, S. Shankar, 2005 .

Dual dielectric silicon metal-oxide-semiconductor field-effect transistors as radiation sensors

W. J. Meyer, R. C. Hughes, S. Yoon, 1989 .

Formation of interface traps in metal‐oxide‐semiconductor devices during isochronal annealing after irradiation at 78 K

D. Griscom, N. Saks, R. B. Klein, 1991 .