J. Opitz

PROGRESS IN 193nm POSITIVE RESISTS

R. D. Allen, G. Wallraff, R. Sooriyakumaran, 1996 .

Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems

G. Wallraff, K. Petrillo, R. Sooriyakumaran, 1998 .

Diffusion and Distribution Studies of Photoacid Generators:Ion Beam Analysis in Lithography

C. Keimel, C. Ober, Guangyuan Xu, 1999 .

IBM 193nm Semiconductor Resist: Material Properties, Resist Characteristics and Lithographic Performance

M. C. Lawson, P. R. Varanasi, Hiroshi Ito, 1999 .

Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance.

R. Sooriyakumaran, P. R. Varanasi, Hiroshi Ito, 1999 .

Dissolution/swelling behavior of cycloolefin polymers in aqueous base

Hiroshi Ito, Thomas I. Wallow, George M. Jordhamo, 2000, Advanced Lithography.

Platform-Dependent Properties of 193nm Single Layer Resists

Robert A. Shick, P. Brock, R. Sooriyakumaran, 1998 .

Advanced Materials for Electronic Applications by Polymerization of Cyclic Olefins Using Late Transition Metal Catalysts

Donald C. Hofer, Thomas I. Wallow, Juliann Opitz, 1998 .