Yukio Nishimura

Novel Classes of Cyclic Olefin Polymers for 193nm Lithography

R. D. Allen, H. Truong, P. R. Varanasi, 2001 .

Line edge roughness in chemically amplified resist: Speculation, simulation and application

M. Stewart, J. Meiring, Yukio Nishimura, 2005 .

New Polymer Design by DLS Analysis of Development Defect Detection

Yoshikazu Yamaguchi, Kenji Hoshiko, Yutaka Makita, 2008 .

Characterization of a Sol-Gel Derived Pb(Zr, Ti)O3 Thin-Film Capacitor with Polycrystalline SrRuO3 Electrodes

Yukio Nishimura, I. Murayama, K. Aoki, 1997 .

193nm single layer photoresists: defeating tradeoffs with a new class of fluoropolymers

Wenjie Li, Takashi Chiba, Pushkara Rao Varanasi, 2005, SPIE Advanced Lithography.