Mikio Yamachika

Development of SSQ Based 157 nm Photoresist.

Raymond J. Hung, T. Shimokawa, Mikio Yamachika, 2002 .

Photochemical properties of PbS microcrystallites prepared in Nafion

H. Yoneyama, H. Miyoshi, Mikio Yamachika, 1990 .

Photocatalytic conversion of lactic acid to malic acid through pyruvic acid in the presence of malic enzyme and semiconductor photocatalysts

H. Yoneyama, H. Inoue, Mikio Yamachika, 1992 .

SCAA mask exposures and Phase Phirst designs for 100 nm and below

Takeaki Ebihara, Mikio Yamachika, Marc D. Levenson, 2001, SPIE Advanced Lithography.

Polymers for 157-nm photoresist applications: a progress report

Jeff D. Byers, Brian Osborn, C. Grant Willson, 2000, Advanced Lithography.