Wolfgang Emer

System qualification and optimization for imaging performance on the 0.80-NA 248-nm step-and-scan systems

Koen van Ingen Schenau, Hans Bakker, Mark Zellenrath, 2002, SPIE Advanced Lithography.

Extending single-exposure patterning towards 38-nm half-pitch using 1.35 NA immersion

Igor Bouchoms, Jan Mulkens, Andre Engelen, 2009, Advanced Lithography.