Satoshi Tanaka

Low k1 Contact Hole Formation by Double Line and Space Formation Method with Contact Hole Mask and Dipole Illumination

J. Abe, Y. Taniguchi, S. Mimotogi, 2006 .

Title Yield-aware mask assignment using positive semidefinite relaxation in LELECUT triple patterning

Tomomi Matsui, Satoshi Tanaka, C. Kodama, 2017 .

Application of Extreme Ultraviolet Lithography to Test Chip Fabrication

H. Aoyama, S. Magoshi, Satoshi Tanaka, 2011 .