H. Kikuyama

Gas-phase selective etching of native oxide

T. Ohmi, N. Miki, H. Kikuyama, 1990 .

Etching of Various SiO2

A. Teramoto, H. Kikuyama, M. Miyashita, 2005, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing.

Surface active buffered hydrogen fluoride having excellent wettability for ULSI processing

T. Ohmi, N. Miki, H. Kikuyama, 1990 .

A Study of the Dissociation State and the SiO2 Etching Reaction for HF Solutions of Extremely Low Concentration

T. Ohmi, N. Miki, H. Kikuyama, 1994 .

Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution

Masayuki Miyashita, Tadahiro Ohmi, Jun Takano, 1992 .