I. Kawanabe

Gas-phase selective etching of native oxide

T. Ohmi, N. Miki, H. Kikuyama, 1990 .

Dependence of thin-oxide films quality on surface microroughness

T. Ohmi, I. Kawanabe, M. Miyashita, 1992 .

Surface active buffered hydrogen fluoride having excellent wettability for ULSI processing

T. Ohmi, N. Miki, H. Kikuyama, 1990 .

Particles in Ulsi Grade Chemicals and Their Adhesion to Silicon Surfaces

T. Ohmi, I. Kawanabe, M. Miyashita, 1991 .

Principles of wet chemical processing in ULSI microfabrication

T. Ohmi, N. Miki, I. Kawanabe, 1991 .

Particle deposition and removal in wet cleaning processes for ULSI manufacturing

T. Ohmi, I. Kawanabe, M. Miyashita, 1992 .

Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution

Masayuki Miyashita, Tadahiro Ohmi, Jun Takano, 1992 .

Dependence of Thin Oxide Films Quality on Surface Micro-Roughness

Masayuki Miyashita, Tadahiro Ohmi, I. Kawanabe, 1991, 1991 Symposium on VLSI Technology.