Jing Sha

New architectures for high resolution patterning

Nelson Felix, Christopher K. Ober, Anuja De Silva, 2008, SPIE Advanced Lithography.

Achieving small dimensions with an environmentally friendly solvent: photoresist development using supercritical CO2

Christopher K. Ober, Anuja De Silva, Jing Sha, 2008, SPIE Advanced Lithography.

Unconventional Processing And Characterization Methods In Lithography

Jing Sha, J. Sha, 2010 .

The integration of 193i and DSA for BEOL metal cuts/blocks targeting sub-20nm tip-to-tip CD

Nelson Felix, Kafai Lai, Jing Guo, 2018, Advanced Lithography.

Molecular glass resists developable in supercritical carbon dioxide for 193 nm lithography

Christopher K. Ober, Jing Sha, Jin-Kyun Lee, 2009, Advanced Lithography.

Incorporating process variation contours in design rule calculation and SRAM design optimization

Jing Sha, Dongbing Shao, Jinning Liu, 2019, Advanced Lithography.

Single-Chip Integrated 3-D Hall Sensor

Wei Li, Li Li, Jing Sha, 2013, 2013 Third International Conference on Instrumentation, Measurement, Computer, Communication and Control.

Environmentally friendly processing of photoresists in scCO2 and decamethyltetrasiloxane

Christopher K. Ober, Jing Sha, Jin-Kyun Lee, 2010, Advanced Lithography.

Molecular glass resists for next generation lithography

Nelson Felix, Christopher K. Ober, Anuja De Silva, 2008, SPIE Advanced Lithography.

Sub-millisecond post exposure bake of chemically amplified resists by CO2 laser heat treatment

Christopher K. Ober, Byungki Jung, Michael O. Thompson, 2010, Advanced Lithography.

Molecular glass resists for next-generation lithography

Marie Krysak, Christopher K. Ober, Anuja De Silva, 2009, Advanced Lithography.