Stewart Rose

Dependence of EM performance on linewidth for Cu dual-inlaid structures

Martin Gall, Larry Zhao, Cristiano Capasso, 2000, Other Conferences.

EUV mask fabrication with Cr absorber

Scott Daniel Hector, Edita Tejnil, Pawitter J. S. Mangat, 2000, Advanced Lithography.

Electromigration failure modes and Blech effect in single-inlaid Cu interconnects

Larry Zhao, Cristiano Capasso, Stacye R. Thrasher, 2000, Other Conferences.

Microstructural characterization of inlaid copper interconnect lines

Ehrenfried Zschech, Larry Zhao, Stewart Rose, 2001 .