K. Shibusawa

Introduction of Atomically Flattening of Si Surface to Large-Scale Integration Process Employing Shallow Trench Isolation

S. Sugawa, A. Teramoto, R. Kuroda, 2016 .

Atomically flattening of Si surface of silicon on insulator and isolation-patterned wafers

T. Ohmi, S. Sugawa, A. Teramoto, 2015 .

Experimental Investigation of Effect of Channel Doping Concentration on Random Telegraph Signal Noise

Tadahiro Ohmi, Shigetoshi Sugawa, Akinobu Teramoto, 2010 .

Impact of Channel Doping Concentration on Random Telegraph Signal Noise

T. Ohmi, S. Sugawa, A. Teramoto, 2009 .

Investigation of stress-induced defects in shallow trench isolation by cathodoluminescence and Raman spectroscopies

K. Matsuda, K. Shibusawa, R. Sugie, 2006 .

Analysis of Source Follower Random Telegraph Signal Using nMOS and pMOS Array TEG

Tadahiro Ohmi, Naoto Miyamoto, Rihito Kuroda, 2007 .