S. Fujimura

发表

Native Oxide Characterization on Silicon Surfaces

H. Ogawa, C. Inomata, K. Ishikawa, 1994 .

Dependence of TO and LO mode frequency of thermally grown silicon dioxide films on annealing temperature

H. Ogawa, K. Ishikawa, S. Fujimura, 1997 .

Effects of crystal disorder on the molecular hydrogen formation in silicon

M. Kitajima, N. Fukata, S. Fujimura, 1999 .

Ion implantation change in the chemical structure of a resist

H. Yano, S. Fujimura, J. Konno, 1989 .

Additive Nitrogen Effects on Oxygen Plasma Downstream Ashing

H. Yano, S. Fujimura, M. Nakamura, 1990 .

REACTION OF THE FLUORINE ATOM AND MOLECULE WITH THE HYDROGEN-TERMINATED SI(111) SURFACE

Y. Horiike, T. Ichiki, Y. Morikawa, 1998 .

Resist stripping in an O2+H2O plasma downstream

S. Fujimura, Miki T. Suzuki, M. Nakamura, 1991 .

Initial stage of native oxide growth on hydrogen terminated silicon (111) surfaces

H. Ogawa, C. Inomata, K. Ishikawa, 1996 .

CONTRIBUTION OF INTERFACE ROUGHNESS TO THE INFRARED SPECTRA OF THERMALLY GROWN SILICON DIOXIDE FILMS

H. Ogawa, K. Ishikawa, S. Fujimura, 1999 .

Native Oxide Removal on Si Surfaces by NF3-Added Hydrogen and Water Vapor Plasma Downstream Treatment

H. Ogawa, S. Fujimura, J. Kikuchi, 1994 .

Effects of H2O on Atomic Hydrogen Generation in Hydrogen Plasma

Hiroshi Yano, Shuzo Fujimura, Masafumi Suzuki, 1993, Other Conferences.

Etching Characteristics During Cleaning of Silicon Surfaces by NF 3 -added Hydrogen and Water-Vapor Plasma Downstream Treatment

S. Fujimura, J. Kikuchi, Miki T. Suzuki, 1997 .

Cleaning of Silicon Surfaces by NF3-Added Hydrogen and Water-Vapor Plasma Downstream Treatment

S. Fujimura, H. Horiike, J. Kikuchi, 1995 .

Hydrogen molecules and hydrogen-related defects in crystalline silicon

M. Kitajima, N. Fukata, S. Fujimura, 1997 .

Hydrogen Passivation of Donors and Hydrogen States in Heavily Doped n-Type Silicon

N. Fukata, S. Fujimura, H. Haneda, 1996 .

Analysis of native oxide growth process on an atomically flattened and hydrogen terminated Si (111) surface in pure water using Fourier transformed infrared reflection absorption spectroscopy

H. Ogawa, K. Ishikawa, S. Fujimura, 1998 .

Screening Effect of Binding of P-Si-H Complex in Silicon

K. Murakami, N. Fukata, S. Fujimura, 1995 .

Hydrogen Molecules in Crystalline Silicon Treated with Atomic Hydrogen.

S. Fujimura, K. Ishioka, Ishioka, 1996, Physical review letters.