Yudong Kim

发表

MOBY, a Radiometric Buoy for Performance Monitoring and Vicarious Calibration of Satellite Ocean Color Sensors: Measurement and Data Analysis Protocols

D. Clark, J. Mueller, W. Broenkow, 2003 .

Ocean Optics Protocols For Satellite Ocean Color Sensor Validation, Revision 5, Volume VI: Special Topics in Ocean Optics Protocols, Part 2

C. McClain, D. Clark, J. Mueller, 2004 .

Conventional n-channel MOSFET devices using single layer HfO/sub 2/ and ZrO/sub 2/ as high-k gate dielectrics with polysilicon gate electrode

G. Bersuker, R. Bergmann, G. Gebara, 2001, International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224).

High-k gate stacks for planar, scaled CMOS integrated circuits

George A. Brown, G. Bersuker, P. Lysaght, 2003 .

Melt filaments in n+pn+ lateral bipolar ESD protection devices

K. Parat, T. Maloney, Yudong Kim, 1996, Electrical Overstress/Electrostatic Discharge Symposium Proceedings.

MOBY, a Radiometric Buoy for Performance Monitoring and Vcarious Calibration of Satellite Ocean Color Sensors: Measurement and Data Analysis Protocols, ed. by J.L. Mueller, G.S. Fargion, and C.R. McClain

D. Clark, J. Mueller, W. Broenkow, 2003 .

The effect of ion-implantation damage on dopant diffusion in silicon during shallow-junction formation

Hisham Z. Massoud, Richard B. Fair, H. Z. Massoud, 1989 .

Boron profile changes during low‐temperature annealing of BF+2‐implanted silicon

H. Z. Massoud, H. Massoud, R. Fair, 1988 .

Salicidation Processes and CoSi2 Resistance Study

Zengtao Liu, Yudong Kim, N. Rangaraju, 2015, 2015 IEEE Workshop on Microelectronics and Electron Devices (WMED).

Overview of the Radiometric Calibration of MOBY, ed. by W.L. Barnes

S. Brown, M. Yarbrough, M. Feinholz, 2002 .

Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow

G. Bersuker, R. Bergmann, P. Lysaght, 2001 .