T. Yoshimi

Analysis of Hydrogen Content in Plasma Silicon Nitride Film

T. Yoshimi, H. Sakai, keizou tanaka, 1980 .

In Situ Monitoring of Film Deposition Using He–Ne Laser System II . Measurements of Polycrystalline Silicon Film in the Infrared

Y. Homma, T. Yoshimi, H. Okuyama, 1974 .

In Situ Monitoring of Film Deposition Using He‐Ne Laser System I . Measurements of CVD Insulating Film at 6328Aå

T. Yoshimi, H. Okuyama, K. Sugawara, 1974 .

Plasma‐Activated Deposition and Properties of Phosphosilicate Glass Film

T. Yoshimi, H. Sakai, M. Shibata, 1984 .